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二氧化硅在钠钙玻璃表面离子导电区域的选择性沉积。

Selective Deposition of SiO2 on Ion Conductive Area of Soda-lime Glass Surface.

作者信息

Sakai Daisuke, Harada Kenji, Hara Yuichiro, Ikeda Hiroshi, Funatsu Shiro, Uraji Keiichiro, Suzuki Toshio, Yamamoto Yuichi, Yamamoto Kiyoshi, Ikutame Naoki, Kawaguchi Keiga, Kaiju Hideo, Nishii Junji

机构信息

Department of Electrical and Electronic Engineering, Kitami Institute of Technology, 165 Koen-cho, Kitami, Hokkaido 090-8507, Japan.

Department of Computer Science, Kitami Institute of Technology, 165 Koen-cho, Kitami, Hokkaido 090-8507, Japan.

出版信息

Sci Rep. 2016 Jun 13;6:27767. doi: 10.1038/srep27767.

Abstract

Selective deposition of SiO2 nanoparticles was demonstrated on a soda-lime glass surface with a periodic sodium deficient pattern formed using the electrical nanoimprint. Positively charged SiO2 particles generated using corona discharge in a cyclic siloxane vapor, were selectively deposited depending on the sodium pattern. For such phenomena to occur, the sodium ion migration to the cathode side was indispensable to the electrical charge compensation on the glass surface. Therefore, the deposition proceeded preferentially outside the alkali-deficient area. Periodic SiO2 structures with 424 nm and 180 nm heights were obtained using one-dimensional (6 μm period) and two-dimensional (500 nm period) imprinted patterns.

摘要

通过电纳米压印在钠钙玻璃表面形成具有周期性缺钠图案,从而实现了二氧化硅纳米颗粒的选择性沉积。在环状硅氧烷蒸气中利用电晕放电产生的带正电的二氧化硅颗粒,根据钠图案进行选择性沉积。为了发生这种现象,钠离子向阴极侧迁移对于玻璃表面的电荷补偿是必不可少的。因此,沉积优先在缺碱区域之外进行。使用一维(周期为6μm)和二维(周期为500nm)压印图案获得了高度为424nm和180nm的周期性二氧化硅结构。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bc2f/4904222/125bcf8f1fc2/srep27767-f1.jpg

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