Kim Taehoon, Park Kwangwon, Kim Jongsu
J Nanosci Nanotechnol. 2016 Feb;16(2):1689-92. doi: 10.1166/jnn.2016.11980.
Indium-free Al and Ga-codoped ZnO (AGZO) multilayer films with nanoscale Ag interlayer were deposited by dual target roll-to-roll RF for AGZO and DC sputtering systems for Ag at room temperature for a large scale. The thicknesses of AGZO/Ag/AGZO multilayer were optimized by changing the roll speed: 0.15/1.1/0.15 m/min for AGZO/Ag/AGZO multilayers, respectively. The optimum thicknesses of AGZO/Ag/AGZO multilayer are 9.21, 8.32 and 8.04 nm, respectively. Optimized AGZO/Ag/AGZO multilayer films showed an excellent transparency (84% at 550 nm) and a low sheet resistance (9.2 omega/sq.) on PET substrates for opto-electronic applications. The effects of nanoscale Ag interlayer on optical and electrical properties of AGZO/Ag/AGZO multilayer films were discussed.
通过用于AGZO的双靶卷对卷射频和用于银的直流溅射系统,在室温下大规模沉积具有纳米级银中间层的无铟铝镓共掺杂氧化锌(AGZO)多层膜。通过改变卷速优化AGZO/Ag/AGZO多层膜的厚度:AGZO/Ag/AGZO多层膜的卷速分别为0.15/1.1/0.15米/分钟。AGZO/Ag/AGZO多层膜的最佳厚度分别为9.21、8.32和8.04纳米。优化后的AGZO/Ag/AGZO多层膜在用于光电子应用的PET基板上表现出优异的透明度(550纳米处为84%)和低方块电阻(9.2欧姆/平方)。讨论了纳米级银中间层对AGZO/Ag/AGZO多层膜光学和电学性能的影响。