Université Grenoble Alpes, F-38000 Grenoble, France.
Nanoscale. 2016 Aug 18;8(33):15162-6. doi: 10.1039/c6nr04606a.
If surface effects are neglected, any change of the Fermi level in a semiconductor is expected to result in an equal and opposite change of the work function. However, this is in general not observed in three-dimensional semiconductors, because of Fermi level pinning at the surface. By combining Kelvin probe force microscopy and scanning tunneling spectroscopy on single layer graphene, we measure both the local work function and the charge carrier density. The one-to-one equivalence of changes in the Fermi level and the work function is demonstrated to accurately hold in single layer graphene down to the nanometer scale.
如果忽略表面效应,预计半导体中费米能级的任何变化都将导致功函数的相等且相反的变化。然而,由于费米能级在表面处被钉扎,这在一般情况下在三维半导体中是观察不到的。通过在单层石墨烯上结合 Kelvin 探针力显微镜和扫描隧道谱,我们测量了局部功函数和载流子密度。在单层石墨烯中,费米能级和功函数的变化精确地保持一一对应关系,甚至在纳米尺度上也是如此。