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功能化 X-Bi(111)(X = Ga、In 和 Tl)双层中的拓扑能带阶跃迁和量子自旋霍尔边缘工程。

Topological band-order transition and quantum spin Hall edge engineering in functionalized X-Bi(111) (X = Ga, In, and Tl) bilayer.

机构信息

Department of Emerging Materials Science, DGIST, Daegu 42988, Republic of Korea.

出版信息

Sci Rep. 2016 Sep 14;6:33395. doi: 10.1038/srep33395.

Abstract

Functionalized X-Bi bilayers (X = Ga, In, and Tl) with halogens bonded on their both sides have been recently claimed to be the giant topological insulators due to the strong band inversion strengths. Employing the first-principles electronic structure calculation, we find the topological band order transition from the order p - p - s of the X-Bi bilayers with halogens on their both sides to the new order p - s - p of the bilayers (especially for X = Ga and In) with halogen on one side and hydrogen on the other side, where the asymmetric hydrogen bonding simulates the substrate. We further find that the p - s bulk band gap of the bilayer bearing the new order p - s - p sensitively depends on the electric field, which enables a meaningful engineering of the quantum spin Hall edge state by controlling the external electric field.

摘要

最近,人们声称功能化的 X-Bi 双层(X=Ga、In 和 Tl),其两侧都有卤素键合,由于强的能带反转强度,是巨大的拓扑绝缘体。通过第一性原理电子结构计算,我们发现拓扑带序从两侧有卤素的 X-Bi 双层的 p- p- s 序转变为具有卤素一侧和氢另一侧的双层的新的 p- s- p 序(特别是对于 X=Ga 和 In),其中非对称氢键模拟衬底。我们进一步发现,具有新的 p- s- p 序的双层的体带隙强烈依赖于电场,这使得通过控制外部电场来工程量子自旋霍尔边缘态成为可能。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/88dc/5022058/b0713759d0da/srep33395-f1.jpg

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