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原子层沉积生长的超薄氧化铜薄膜异常的厚度依赖性光学能隙

Anomalous thickness-dependent optical energy gap of ALD-grown ultra-thin CuO films.

作者信息

Tripathi T S, Terasaki I, Karppinen M

机构信息

Department of Chemistry, Aalto University, PO Box 16100, FI-00076 Aalto, Finland.

出版信息

J Phys Condens Matter. 2016 Nov 30;28(47):475801. doi: 10.1088/0953-8984/28/47/475801. Epub 2016 Sep 16.

Abstract

Usually an inverse square relation between the optical energy gap and the size of crystallites is observed for semiconducting materials due to the strong quantum localization effect. Coulomb attraction that may lead to a proportional dependence is often ignored or considered less important to the optical energy gap when the crystallite size or the thickness of a thin film changes. Here we report a proportional dependence between the optical energy gap and the thickness of ALD-grown CuO thin films due to a strong Coulomb attraction. The ultrathin films deposited in the thickness range of 9-81 nm show a p-type semiconducting behavior when analyzed by Seebeck coefficient and electrical resistivity measurements. The indirect optical energy gap nature of the films is verified from UV-vis spectrophotometric measurements. A progressive increase in the indirect optical energy gap from 1.06 to 1.24 eV is observed with the increase in the thickness of the films. The data are analyzed in the presence of Coulomb attractions using the Brus model. The optical energy gap when plotted against the cubic root of the thickness of the films shows a linear dependence.

摘要

由于强量子局域效应,通常在半导体材料中观察到光能量隙与微晶尺寸之间存在平方反比关系。当微晶尺寸或薄膜厚度变化时,可能导致比例依赖关系的库仑吸引力通常被忽略或被认为对光能量隙不太重要。在此,我们报道了由于强库仑吸引力,光能量隙与原子层沉积生长的CuO薄膜厚度之间存在比例依赖关系。通过塞贝克系数和电阻率测量分析,沉积厚度在9 - 81 nm范围内的超薄薄膜呈现p型半导体行为。通过紫外可见分光光度测量验证了薄膜的间接光能量隙性质。随着薄膜厚度增加,观察到间接光能量隙从1.06 eV逐渐增加到1.24 eV。使用布鲁斯模型在存在库仑吸引力的情况下对数据进行了分析。当光能量隙与薄膜厚度的立方根作图时,呈现出线性依赖关系。

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