Zamani M, Shafiei F, Fazeli S M, Downer M C, Jafari G R
Department of Physics, Shahid Beheshti University, G. C., Evin, Tehran 19839, Iran.
Department of Physics, The University of Texas at Austin, Austin, Texas 78712, USA.
Phys Rev E. 2016 Oct;94(4-1):042809. doi: 10.1103/PhysRevE.94.042809. Epub 2016 Oct 28.
We derive an analytic expression for the height correlation function of a homogeneous, isotropic rough surface based on the inverse wave scattering method of Kirchhoff theory. The expression directly relates the height correlation function to diffuse scattered intensity along a linear path at fixed polar angle. We test the solution by measuring the angular distribution of light scattered from rough silicon surfaces and comparing extracted height correlation functions to those derived from atomic force microscopy (AFM). The results agree closely with AFM over a wider range of roughness parameters than previous formulations of the inverse scattering problem, while relying less on large-angle scatter data. Our expression thus provides an accurate analytical equation for the height correlation function of a wide range of surfaces based on measurements using a simple, fast experimental procedure.
我们基于基尔霍夫理论的逆波散射方法,推导了均匀、各向同性粗糙表面高度相关函数的解析表达式。该表达式直接将高度相关函数与固定极角下沿直线路径的漫散射强度联系起来。我们通过测量从粗糙硅表面散射的光的角分布,并将提取的高度相关函数与从原子力显微镜(AFM)获得的函数进行比较,来检验该解。与之前的逆散射问题公式相比,在更广泛的粗糙度参数范围内,结果与AFM非常吻合,同时对大角度散射数据的依赖较少。因此,我们的表达式基于使用简单、快速实验程序的测量,为广泛表面的高度相关函数提供了一个精确的解析方程。