Karabacak T, Zhao Y, Stowe M, Quayle B, Wang G C, Lu T M
Department of Physics, Applied Physics, and Astronomy, Rensselaer Polytechnic Institute, Troy, New York 12180-3590, USA.
Appl Opt. 2000 Sep 1;39(25):4658-68. doi: 10.1364/ao.39.004658.
An in-plane light scattering setup that is capable of measuring large azimuthal scattering angles is presented. This type of measurement makes it easier to probe large k(parallel) at a fixed k(perpendicular) value (k(parallel) and k(perpendicular) are momentum transfer vectors parallel and perpendicular to the surface, respectively). Therefore the system allows us to explore small lateral scale and large vertical roughness (approximately lambda, the wavelength of the probe beam) of a rough surface. In-plane intensity measurements from a rough backside Si wafer and a Cu thin-film surface are reported. The structure factor that is related to surface roughness parameters is obtained from the measured in-plane intensity profiles. Both scalar (Beckmann-Kirchhoff) and vector (Rayleigh-Rice) theories have been applied to interpret the experimental data. The roughness parameters obtained from the scattering measurements are compared with those measured by atomic-force microscopy.
介绍了一种能够测量大方位角散射角的面内光散射装置。这种测量类型使得在固定的k(垂直)值下探测大的k(平行)更容易(k(平行)和k(垂直)分别是平行于和垂直于表面的动量传递矢量)。因此,该系统使我们能够探索粗糙表面的小横向尺度和大垂直粗糙度(约为探测光束的波长λ)。报道了从粗糙的背面硅片和铜薄膜表面进行的面内强度测量。从测量的面内强度分布中获得了与表面粗糙度参数相关的结构因子。标量(贝克曼 - 基尔霍夫)理论和矢量(瑞利 - 莱斯)理论都已应用于解释实验数据。将从散射测量中获得的粗糙度参数与通过原子力显微镜测量的参数进行了比较。