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具有超小模态质量和高光机械耦合率的紫外光机械晶体腔。

Ultraviolet optomechanical crystal cavities with ultrasmall modal mass and high optomechanical coupling rate.

作者信息

Zhou Wen, Yu Zejie, Ma Jingwen, Zhu Bingqing, Tsang Hon Ki, Sun Xiankai

机构信息

Department of Electronic Engineering, The Chinese University of Hong Kong, Shatin, New Territories, Hong Kong.

Shun Hing Institute of Advanced Engineering, The Chinese University of Hong Kong, Shatin, New Territories, Hong Kong.

出版信息

Sci Rep. 2016 Nov 28;6:37134. doi: 10.1038/srep37134.

Abstract

Optomechanical crystal (OMC) cavities which exploit the simultaneous photonic and phononic bandgaps in periodic nanostructures have been utilized to colocalize, couple, and transduce optical and mechanical resonances for nonlinear interactions and precision measurements. The development of near-infrared OMC cavities has difficulty in maintaining a high optomechanical coupling rate when scaling to smaller mechanical modal mass because of the reduction of the spatial overlap between the optical and mechanical modes. Here, we explore OMC nanobeam cavities in gallium nitride operating at the ultraviolet wavelengths to overcome this problem. With a novel optimization strategy, we have successfully designed an OMC cavity, with a size of 3.83 × 0.17 × 0.13 μm and the mechanical modal mass of 22.83 fg, which possesses an optical mode resonating at the wavelength of 393.03 nm and the fundamental mechanical mode vibrating at 14.97 GHz. The radiation-limited optical Q factor, mechanical Q factor, and optomechanical coupling rate are 2.26 × 10, 1.30 × 10, and 1.26 MHz, respectively. Our design and optimization approach can also serve as the general guidelines for future development of OMC cavities with improved device performance.

摘要

利用周期性纳米结构中同时存在的光子和声子带隙的光机械晶体(OMC)腔,已被用于将光学和机械共振进行共定位、耦合和转换,以实现非线性相互作用和精确测量。由于光学模式和机械模式之间空间重叠的减少,当缩小到更小的机械模态质量时,近红外OMC腔的发展难以维持高光机械耦合率。在此,我们探索在紫外波长下工作的氮化镓OMC纳米梁腔来克服这一问题。通过一种新颖的优化策略,我们成功设计了一个尺寸为3.83×0.17×0.13μm、机械模态质量为22.83 fg的OMC腔,它具有一个在393.03 nm波长处共振的光学模式和一个在14.97 GHz振动的基模机械模式。辐射限制的光学品质因数、机械品质因数和光机械耦合率分别为2.26×10、1.30×10和1.26 MHz。我们的设计和优化方法也可为未来提高器件性能的OMC腔的发展提供通用指导方针。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/32a8/5125004/4efa94941790/srep37134-f1.jpg

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