Laboratory of Innovation in Surface Chemistry and Nanosciences (LICSEN), NIMBE, CEA, CNRS, Université Paris-Saclay , CEA Saclay, 91191 Gif-sur-Yvette, Cedex, France.
LPICM, CNRS, Ecole Polytechnique, Université Paris Saclay , 91128 Palaiseau, France.
ACS Appl Mater Interfaces. 2017 Jan 25;9(3):2369-2377. doi: 10.1021/acsami.6b12912. Epub 2017 Jan 10.
Fabrication at low cost of transparent p-type semiconductors with suitable electronic properties is essential toward the scalability of many electronic devices, especially for photovoltaic and photocatalytic applications. In this context, the synthesis of mesoporous NiO films through inkjet printing of a sol-gel ink was investigated for the first time. Nickel chloride and Pluronic F-127, used as nickel oxide precursor and pore-forming agent, respectively, were formulated in a water/ethanol mixture to prepare a jettable ink for Dimatix printer. Multilayer NiO films were formed, and different morphologies could be obtained by playing on the interlayer thermal treatment. At low temperature (30 °C), a porous nanoparticulate-nanofiber dual-pore structure was observed. On the other hand, with a high temperature treatment (450 °C), nanoparticulate denser films without any dual structure were obtained. The mechanism for NiO formation during the final sintering step, investigated by means of X-ray photolectron spectroscopy, shows that a Ni(OH) species is an intermediate between NiCl and NiO. The different morphologies and thicknesses of the NiO films were correlated to their performance in a p-DSSC configuration, using a new push-pull dye (so-called "RBG-174") and an iodine-based electrolyte. Moreover, the positive impact of a nanometric NiO layer deposited by spin-coating and introduced between FTO and the NiO mesoporous network is highlighted in the present work. The best results were obtained with NiO/four layer-NiO mesoporous photocathodes of 860 nm, with a current density at the short circuit of 3.42 mA cm (irradiance of 100 mW cm spectroscopically distributed following AM 1.5).
低成本制造具有合适电子性能的透明 p 型半导体对于许多电子设备的可扩展性至关重要，特别是对于光伏和光催化应用。在这种情况下，首次通过喷墨打印溶胶-凝胶墨水研究了介孔 NiO 薄膜的合成。氯化镍和 Pluronic F-127 分别用作氧化镍前体和造孔剂，在水/乙醇混合物中配制可喷射油墨，用于 Dimatix 打印机。形成了多层 NiO 薄膜，并且可以通过在层间热处理上发挥作用来获得不同的形态。在低温（30°C）下，观察到多孔纳米颗粒-纳米纤维双孔结构。另一方面，在高温处理（450°C）下，获得了没有任何双结构的致密纳米颗粒薄膜。通过 X 射线光电子能谱研究了最终烧结步骤中 NiO 形成的机理，表明 Ni(OH)物种是 NiCl 和 NiO 之间的中间体。通过使用新的推拉染料（所谓的“RBG-174”）和碘基电解质，将 NiO 薄膜的不同形态和厚度与其在 p-DSSC 配置中的性能相关联。此外，在本工作中强调了通过旋涂沉积并引入 FTO 和 NiO 介孔网络之间的纳米 NiO 层的积极影响。用 NiO/四层-NiO 介孔光阴极获得了 860nm 的最佳结果，短路电流密度为 3.42mA cm（根据 AM 1.5 分光辐照度为 100mW cm）。
