Suppr超能文献

中缝背核神经元对丘脑外侧中央核和内侧前额叶皮质电刺激的反应。

Dorsal raphe neuronal responses to thalamic centralis lateralis and medial prefrontal cortex electrical stimulation.

作者信息

Condés-Lara M, Omaña Zapata I, León-Olea M, Sánchez-Alvarez M

机构信息

Departamento de Neurofisiología, Instituto Mexicano de Psiquiatria, México.

出版信息

Brain Res. 1989 Oct 9;499(1):141-4. doi: 10.1016/0006-8993(89)91143-8.

Abstract

The present study gives evidence for ascending pathways from the dorsal raphe nucleus (DR) to the centralis lateralis nucleus (CL) and to the medial prefrontal cortex (PFCx). Single-unit recordings were done at dorsal raphe level and electrical stimulation was applied at CL and PFCx regions causing antidromic and orthodromic activity in DR cells. The speed conduction difference of the antidromic DR responses to CL and PFCx stimulation was significantly different, but the latencies of the same responses showed no differences. Therefore, we conclude that the DR pathways to CL and to PFCx structures reach their target cells at similar times.

摘要

本研究为从背侧缝际核(DR)到外侧中央核(CL)以及内侧前额叶皮质(PFCx)的上行通路提供了证据。在背侧缝际核水平进行单单位记录,并在CL和PFCx区域施加电刺激,从而在DR细胞中引发逆向和顺向活动。DR对CL和PFCx刺激的逆向反应的传导速度差异显著,但相同反应的潜伏期没有差异。因此,我们得出结论,DR到CL和PFCx结构的通路在相似的时间到达其靶细胞。

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验