Djurović S, Roberts J R, Sobolewski M A, Olthoff J K
National Institute of Standards and Technology, Gaithersburg, MD 20899-0001.
J Res Natl Inst Stand Technol. 1993 Mar-Apr;98(2):159-180. doi: 10.6028/jres.098.012.
Spatially- and temporally-resolved measurements of optical emission intensities are presented from rf discharges in argon over a wide range of pressures (6.7 to 133 Pa) and applied rf voltages (75 to 200 V). Results of measurements of emission intensities are presented for both an atomic transition (Ar I, 750.4 nm) and an ionic transition (Ar II, 434.8 nm). The absolute scale of these optical emissions has been determined by comparison with the optical emission from a calibrated standard lamp. All measurements were made in a well-defined rf reactor. They provide detailed characterization of local time-resolved plasma conditions suitable for the comparison with results from other experiments and theoretical models. These measurements represent a new level of detail in diagnostic measurements of rf plasmas, and provide insight into the electron transport properties of rf discharges.
本文给出了在6.7至133帕的宽压力范围和75至200伏的施加射频电压下，氩气射频放电中光发射强度的空间和时间分辨测量结果。给出了原子跃迁（Ar I，750.4纳米）和离子跃迁（Ar II，434.8纳米）的发射强度测量结果。通过与校准标准灯的光发射进行比较，确定了这些光发射的绝对标度。所有测量均在定义明确的射频反应器中进行。它们提供了适用于与其他实验和理论模型结果进行比较的局部时间分辨等离子体条件的详细表征。这些测量代表了射频等离子体诊断测量的新细节水平，并提供了对射频放电电子输运特性的深入了解。
