• 文献检索
  • 文档翻译
  • 深度研究
  • 学术资讯
  • Suppr Zotero 插件Zotero 插件
  • 邀请有礼
  • 套餐&价格
  • 历史记录
应用&插件
Suppr Zotero 插件Zotero 插件浏览器插件Mac 客户端Windows 客户端微信小程序
定价
高级版会员购买积分包购买API积分包
服务
文献检索文档翻译深度研究API 文档MCP 服务
关于我们
关于 Suppr公司介绍联系我们用户协议隐私条款
关注我们

Suppr 超能文献

核心技术专利:CN118964589B侵权必究
粤ICP备2023148730 号-1Suppr @ 2026

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验

具有多个电子源的像差校正超快自旋极化低能电子显微镜的设计与调试。

Design and commissioning of an aberration-corrected ultrafast spin-polarized low energy electron microscope with multiple electron sources.

作者信息

Wan Weishi, Yu Lei, Zhu Lin, Yang Xiaodong, Wei Zheng, Liu Jefferson Zhe, Feng Jun, Kunze Kai, Schaff Oliver, Tromp Ruud, Tang Wen-Xin

机构信息

College of Materials Science and Engineering, Chongqing University, Chongqing 400044, PR China; Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA.

College of Materials Science and Engineering, Chongqing University, Chongqing 400044, PR China.

出版信息

Ultramicroscopy. 2017 Mar;174:89-96. doi: 10.1016/j.ultramic.2016.12.019. Epub 2016 Dec 27.

DOI:10.1016/j.ultramic.2016.12.019
PMID:28063340
Abstract

We describe the design and commissioning of a novel aberration-corrected low energy electron microscope (AC-LEEM). A third magnetic prism array (MPA) is added to the standard AC-LEEM with two prism arrays, allowing the incorporation of an ultrafast spin-polarized electron source alongside the standard cold field emission electron source, without degrading spatial resolution. The high degree of symmetries of the AC-LEEM are utilized while we design the electron optics of the ultrafast spin-polarized electron source, so as to minimize the deleterious effect of time broadening, while maintaining full control of electron spin. A spatial resolution of 2nm and temporal resolution of 10ps (ps) are expected in the future time resolved aberration-corrected spin-polarized LEEM (TR-AC-SPLEEM). The commissioning of the three-prism AC-LEEM has been successfully finished with the cold field emission source, with a spatial resolution below 2nm.

摘要

我们描述了一种新型像差校正低能电子显微镜(AC-LEEM)的设计与调试。在具有两个棱镜阵列的标准AC-LEEM中添加了第三个磁棱镜阵列(MPA),这使得超快自旋极化电子源能够与标准冷场发射电子源一起并入,而不会降低空间分辨率。在设计超快自旋极化电子源的电子光学系统时,我们利用了AC-LEEM的高度对称性,以尽量减少时间展宽的有害影响,同时保持对电子自旋的完全控制。未来的时间分辨像差校正自旋极化低能电子显微镜(TR-AC-SPLEEM)预计空间分辨率为2nm,时间分辨率为10皮秒(ps)。采用冷场发射源的三棱镜AC-LEEM已成功完成调试,空间分辨率低于2nm。

相似文献

1
Design and commissioning of an aberration-corrected ultrafast spin-polarized low energy electron microscope with multiple electron sources.具有多个电子源的像差校正超快自旋极化低能电子显微镜的设计与调试。
Ultramicroscopy. 2017 Mar;174:89-96. doi: 10.1016/j.ultramic.2016.12.019. Epub 2016 Dec 27.
2
Aberration corrected spin polarized low energy electron microscope.像差校正自旋极化低能电子显微镜。
Ultramicroscopy. 2020 Sep;216:113017. doi: 10.1016/j.ultramic.2020.113017. Epub 2020 May 21.
3
A new aberration-corrected, energy-filtered LEEM/PEEM instrument. I. Principles and design.一种新型的像差校正、能谱过滤的 LEEM/PEEM 仪器。I. 原理与设计。
Ultramicroscopy. 2010 Jun;110(7):852-61. doi: 10.1016/j.ultramic.2010.03.005. Epub 2010 Mar 31.
4
Progress toward an aberration-corrected low energy electron microscope for DNA sequencing and surface analysis.用于DNA测序和表面分析的像差校正低能电子显微镜的进展。
J Vac Sci Technol B Nanotechnol Microelectron. 2012 Nov;30(6):6F402. doi: 10.1116/1.4764095. Epub 2012 Oct 26.
5
A monochromatic, aberration-corrected, dual-beam low energy electron microscope.单色、像差校正、双束低能电子显微镜。
Ultramicroscopy. 2013 Jul;130:13-28. doi: 10.1016/j.ultramic.2013.02.018. Epub 2013 Mar 21.
6
Trends in low energy electron microscopy.低能电子显微镜技术的发展趋势。
J Phys Condens Matter. 2010 Mar 5;22(8):084017. doi: 10.1088/0953-8984/22/8/084017.
7
A Contrast Transfer Function approach for image calculations in standard and aberration-corrected LEEM and PEEM.一种用于标准和像差校正 LEEM 和 PEEM 中图像计算的对比传递函数方法。
Ultramicroscopy. 2012 Apr;115:88-108. doi: 10.1016/j.ultramic.2011.11.005. Epub 2011 Nov 22.
8
Catadioptric aberration correction in cathode lens microscopy.阴极透镜显微镜中的折反射像差校正
Ultramicroscopy. 2015 Apr;151:191-198. doi: 10.1016/j.ultramic.2014.09.011. Epub 2014 Oct 16.
9
A new aberration-corrected, energy-filtered LEEM/PEEM instrument II. Operation and results.一种新型的像差校正、能谱滤波的 LEEM/PEEM 仪器 II. 操作和结果。
Ultramicroscopy. 2013 Apr;127:25-39. doi: 10.1016/j.ultramic.2012.07.016. Epub 2012 Aug 7.
10
Measuring chromatic aberration in LEEM/PEEM.在低能电子显微镜/光发射电子显微镜中测量色差。
Ultramicroscopy. 2019 Apr;199:46-49. doi: 10.1016/j.ultramic.2019.01.009. Epub 2019 Feb 10.

引用本文的文献

1
Gigahertz streaking and compression of low-energy electron pulses.千兆赫兹低能电子脉冲的条纹调制与压缩
Struct Dyn. 2024 Apr 1;11(2):024306. doi: 10.1063/4.0000235. eCollection 2024 Mar.