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NbS-MoS-NbS纳米带异质结构的电子特性与晶体管

Electronic properties and transistors of the NbS-MoS-NbS NR heterostructure.

作者信息

Liu Qi, Ouyang Fangping, Yang Zhixiong, Peng Shenglin, Zhou Wenzhe, Zou Hui, Long Mengqiu, Pan Jiangling

机构信息

School of Physics and Electronics, and Institute of Super-Microstructure and Ultrafast Process in Advanced Materials, Central South University, Changsha 410083, People's Republic of China.

出版信息

Nanotechnology. 2017 Jan 11;28(7):075702. doi: 10.1088/1361-6528/aa5365.

Abstract

Based on density function theory and nonequilibrium Green's functions, we construct a NbS-MoS-NbS NR inplane heterostructure. The effects of channel length, width, chirality and vacancy of the heterostructure on transport properties are systematically investigated. The electron transport of the armchair-edge heterostructure device shows ballistic transport properties, while the zigzag-edge heterostructure device exhibits resonance tunneling transport properties. Further study indicates NbS-MoS-NbS field effect transistors (FETs) to be excellent ambipolar transistors. The FETs have high performances with current on/off ratio 4.7 × 10 and subthreshold swing 90 mV/decade with channel length m = 16 and width n = 6.  Increases in the channel length sharply reduce the off-state current and enhance the performance of the devices significantly.

摘要

基于密度泛函理论和非平衡格林函数,我们构建了一种NbS-MoS-NbS纳米带面内异质结构。系统研究了该异质结构的沟道长度、宽度、手性和空位对输运性质的影响。扶手椅边缘异质结构器件的电子输运表现出弹道输运特性,而锯齿边缘异质结构器件则表现出共振隧穿输运特性。进一步研究表明,NbS-MoS-NbS场效应晶体管(FET)是优异的双极晶体管。当沟道长度m = 16且宽度n = 6时,这些FET具有高性能,电流开/关比为4.7×10,亚阈值摆幅为90 mV/十倍频程。沟道长度的增加会大幅降低关态电流并显著提高器件性能。

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