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金属/半导体NbS/磷化硼范德华异质结构的计算研究:电场效应

Computational investigations of the metal/semiconductor NbS/boron phosphide van der Waals heterostructure: effects of an electric field.

作者信息

Vinh Nguyen V, Nguyen Son-Tung, Pham Khang D

机构信息

Faculty of Information Technology, Ho Chi Minh City University of Economics and Finance, Ho Chi Minh City, Vietnam.

Faculty of Electrical Engineering, Hanoi University of Industry, Hanoi 100000, Vietnam.

出版信息

Dalton Trans. 2024 Aug 6;53(31):13022-13029. doi: 10.1039/d4dt01454e.

Abstract

In this work, we design computationally the metal-semiconductor NbS/BP heterostructure and investigate its atomic structure, electronic properties and contact barrier using first-principles prediction. Our results show that the M-S NbS/BP heterostructure is energetically stable and is characterized by weak vdW interactions. Interestingly, we find that the combination of the metallic NbS and semiconducting BP layers leads to the formation of a M-S contact. The M-S NbS/BP heterostructure exhibits a p-type Schottky contact and a low tunneling-specific resistivity of 3.98 × 10 Ω cm, indicating that the metallic NbS can be considered as an efficient 2D electrical contact to the semiconducting BP layer to design NbS/BP heterostructure-based electronic devices with high charge injection efficiency. The contact barrier and contact type in the M-S NbS/BP heterostructure can be adjusted by applying an external electric field. The conversion from p-type ShC to n-type ShC can be achieved by applying a negative electric field, while the transformation from ShC to OhC type can be achieved under the application of a positive electric field. The conversion between p-type and n-type ShC and ShC to OhC type in the NbS/BP heterostructure demonstrates that it can be considered as a promising material for next-generation electronic devices.

摘要

在这项工作中,我们通过计算设计了金属 - 半导体NbS/BP异质结构,并使用第一性原理预测研究了其原子结构、电子性质和接触势垒。我们的结果表明,M - S NbS/BP异质结构在能量上是稳定的,并且具有弱范德华相互作用的特征。有趣的是,我们发现金属NbS和半导体BP层的组合导致形成了一个M - S接触。M - S NbS/BP异质结构表现出p型肖特基接触和3.98×10Ω·cm的低隧穿比电阻率,这表明金属NbS可被视为与半导体BP层的高效二维电接触,以设计具有高电荷注入效率的基于NbS/BP异质结构的电子器件。M - S NbS/BP异质结构中的接触势垒和接触类型可以通过施加外部电场来调节。通过施加负电场可以实现从p型肖特基接触(ShC)到n型肖特基接触的转变,而在施加正电场的情况下可以实现从肖特基接触到欧姆接触(OhC)类型的转变。NbS/BP异质结构中p型和n型肖特基接触之间以及肖特基接触到欧姆接触类型的转变表明,它可被视为下一代电子器件的有前途的材料。

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