State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology , Harbin 150001, People's Republic of China.
Key Laboratory of Micro-systems and Micro-structures Manufacturing, Ministry of Education, Harbin Institute of Technology , Harbin 150080, People's Republic of China.
ACS Appl Mater Interfaces. 2017 Feb 8;9(5):4798-4807. doi: 10.1021/acsami.6b13031. Epub 2017 Jan 30.
Three-dimensional (3D) nanohierarchical Ni nanomace (Ni NM) array was fabricated on copper substrate by only one step with electroplating method, the unique structure was covered with Au film (Ni/Au NM) without changing its morphology, and in the following step, it was sintered with silver nanoparticle (Ag NP) paste. The structure of the Ni NM array and its surface morphology were characterized by X-ray diffraction, scanning electron microscope (SEM), and atomic force microscope. The sintered interface was investigated by SEM, transmission electron microscopy, and energy-dispersive X-ray spectroscopy to analyze the sintering mechanism. The results showed that a metallurgical bond was successfully achieved at 250 °C without any gas or vacuum shield and extra pressure. The Cu substrate with Ni/Au NM array was able to join with the Ag NP paste without obvious voids. Due to the compatible chemical potential between Ag NPs and Ni/Au NM array, the Au element was able to diffuse into the Ag layer with about 800 nm distance. Based on the excellent 3D nanohierarchical structure, the shear strength of Ni/Au NM array was 6 times stronger than the flat Ni/Au coated substrate. It turned out that the substrate surface played a crucial role in improving the shear strength and sintering efficiency. The 3D Ni NM array had achieved an excellent bonding interface and had great potential application in the microelectronics packaging field.
三维(3D)纳米分级镍纳米棒(Ni NM)阵列通过电镀方法在铜衬底上一步制备,独特的结构被覆盖金膜(Ni/Au NM),而不改变其形态,然后下一步,用银纳米颗粒(Ag NP)糊烧结。通过 X 射线衍射、扫描电子显微镜(SEM)和原子力显微镜对 Ni NM 阵列的结构及其表面形貌进行了表征。通过 SEM、透射电子显微镜和能量色散 X 射线光谱研究了烧结界面,以分析烧结机制。结果表明,在 250°C 下无需任何气体或真空屏蔽和额外压力即可成功实现冶金结合。带有 Ni/Au NM 阵列的 Cu 衬底能够与 Ag NP 糊结合,而没有明显的空隙。由于 Ag NPs 和 Ni/Au NM 阵列之间具有相容的化学势,Au 元素能够扩散到约 800nm 距离的 Ag 层中。基于优异的 3D 纳米分级结构,Ni/Au NM 阵列的剪切强度比平坦的 Ni/Au 涂层衬底强 6 倍。事实证明,衬底表面在提高剪切强度和烧结效率方面起着至关重要的作用。3D Ni NM 阵列已经实现了出色的键合界面,在微电子封装领域具有巨大的潜在应用。