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通过 SnS 纳米片修饰实现高灵敏度和快速的单层 WS 光电晶体管。

Highly sensitive and fast monolayer WS phototransistors realized by SnS nanosheet decoration.

机构信息

State Key Laboratory of Metastable Materials Science and Technology, Yanshan University, Qinghuangdao 066004, China.

School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, China.

出版信息

Nanoscale. 2017 Feb 2;9(5):1916-1924. doi: 10.1039/c6nr08610a.

DOI:10.1039/c6nr08610a
PMID:28094828
Abstract

Two-dimensional chalcogenide monolayers are strong candidates for next-generation flexible and transparent optoelectronics. Due to the intrinsic ultrathin thickness and limited optical absorption, however, their responsivity is normally low. Here we develop a simple and low-cost method to fabricate high-performance hybrid phototransistors of monolayer WS with significantly enhanced responsivity and an extended spectral response range, by virtue of surface decoration with liquid-phase exfoliated SnS nanosheets (NSs). The hybrid phototransistors show a much enhanced responsivity of ∼2 A W and an ultrahigh light/dark signal-to-noise ratio of 10 under 457 nm excitation, exhibiting a significant increase of 3 orders of magnitude in responsivity and a 100 fold increase in signal-to-noise ratio, compared with pure WS devices. Our hybrid photodetectors also exhibit a respectable response speed, with a rise and decay time of 51 μs and 98 μs, respectively. After optimal surface decoration with narrow bandgap SnS NSs atop a monolayer WS channel, an emergent optical responsivity in the near infrared region (1064 nm) is also observed.

摘要

二维硫属化物单层是下一代柔性透明光电的有力候选材料。然而,由于其固有超薄厚度和有限的光吸收,其响应率通常较低。在这里,我们开发了一种简单且低成本的方法,通过液相剥离的 SnS 纳米片(NSs)表面修饰,制备出具有显著增强的响应率和扩展光谱响应范围的高性能单层 WS 混合光电晶体管。在 457nm 激发下,混合光电晶体管的响应率高达 2 A W,光/暗信号噪声比高达 10,与纯 WS 器件相比,响应率提高了 3 个数量级,信号噪声比提高了 100 倍。我们的混合光电探测器还表现出令人满意的响应速度,上升和下降时间分别为 51μs 和 98μs。在单层 WS 沟道顶部进行最佳的窄带隙 SnS NS 表面修饰后,也观察到了近红外区域(1064nm)的新兴光响应。

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