Wu Chia-Ching, Shih Wei-Chen
Department of Electronic Engineering, Kao Yuan University, Kaohsiung, Taiwan, Republic of China.
Chem Commun (Camb). 2017 Jan 31;53(10):1634-1637. doi: 10.1039/c6cc08738h.
This research presents a triple-layer transparent conductive oxide thin film, with a lithium-doped nickel oxide/silver/lithium-doped nickel oxide (L-NiO/Ag/L-NiO) structure using radio-frequency (RF) magnetron sputtering on glass substrates. The high transmittance L-NiO thin films were deposited using the sputtering method with Ar/H as the reaction gases. The triple-layer structure, L-NiO/Ag/L-NiO, showed impressive electrical conductivity. The figure of merit (FOM) results indicated that the L-NiO/Ag/L-NiO triple-layer thin films with Ag deposition times of 2 min possessed satisfactory optical and electrical properties for potential applications.
本研究通过射频（RF）磁控溅射在玻璃基板上制备了一种具有锂掺杂氧化镍/银/锂掺杂氧化镍（L-NiO/Ag/L-NiO）结构的三层透明导电氧化物薄膜。采用溅射法，以氩气/氢气作为反应气体沉积了高透过率的L-NiO薄膜。L-NiO/Ag/L-NiO三层结构表现出令人印象深刻的导电性。品质因数（FOM）结果表明，银沉积时间为2分钟的L-NiO/Ag/L-NiO三层薄膜具有令人满意的光学和电学性能，具有潜在的应用价值。
