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用于合成原位 N 插层介孔 WO 光阳极以实现高效可见光驱动水氧化的双功能表面活性剂模板策略

Dual-Functional Surfactant-Templated Strategy for Synthesis of an In Situ N -Intercalated Mesoporous WO Photoanode for Efficient Visible-Light-Driven Water Oxidation.

作者信息

Li Dong, Chandra Debraj, Takeuchi Ryouchi, Togashi Takanari, Kurihara Masato, Saito Kenji, Yui Tatsuto, Yagi Masayuki

机构信息

Department of Materials Science and Technology, Faculty of Engineering, Niigata University, 8050 Ikarashi-2, Niigata, 950-2181, Japan.

Department of Material and Biological Chemistry, Faculty of Science, Yamagata University, 1-4-12 Kojirakawa-machi, Yamagata, 990-8560, Japan.

出版信息

Chemistry. 2017 May 11;23(27):6596-6604. doi: 10.1002/chem.201700088. Epub 2017 Apr 18.

Abstract

N -Intercalated crystalline mesoporous tungsten trioxide (WO ) was synthesized by a thermal decomposition technique with dodecylamine (DDA) as a surfactant template with a dual role as an N-atom source for N intercalation, alongside its conventional structure-directing role (by micelle formation) to induce a mesoporous structure. N physisorption analysis showed that the specific surface area (57.3 m  g ) of WO templated with DDA (WO -DDA) is 2.3 times higher than that of 24.5 m  g for WO prepared without DDA (WO -bulk), due to the mesoporous structure of WO -DDA. The Raman and X-ray photoelectron spectra of WO -DDA indicated intercalation of N into the WO lattice above 450 °C. The UV/Vis diffuse-reflectance spectra exhibited a significant shift of the absorption edge by 28 nm, from 459 nm (2.70 eV) to 487 nm (2.54 eV), due to N intercalation. This could be explained by the bandgap narrowing of WO -DDA by formation of a new intermediate N 2p orbital between the conduction and valance bands of WO . A WO -DDA-coated indium tin oxide (ITO) electrode calcined at 450 °C generated a photoanodic current under visible-light irradiation below 490 nm due to photoelectrochemical water oxidation, as opposed to below 470 nm for ITO/WO -bulk. The incident photon-to-current conversion efficiency (IPCE=24.5 %) at 420 nm and 0.5 V versus Ag/AgCl was higher than that of 2.5 % for ITO/WO -bulk by one order of magnitude due to N intercalation and the mesoporous structure of WO -DDA.

摘要

通过热分解技术,以十二烷基胺(DDA)作为表面活性剂模板合成了N插层的结晶介孔三氧化钨(WO₃)。DDA具有双重作用,它既是用于N插层的N原子源,又在传统的结构导向作用(通过形成胶束)中诱导介孔结构。N物理吸附分析表明,以DDA为模板的WO₃(WO₃-DDA)的比表面积(57.3 m²/g)是未使用DDA制备的WO₃(WO₃-本体)的24.5 m²/g的2.3倍,这归因于WO₃-DDA的介孔结构。WO₃-DDA的拉曼光谱和X射线光电子能谱表明,在450℃以上N插入到WO₃晶格中。紫外/可见漫反射光谱显示,由于N的插入,吸收边发生了28 nm的显著位移,从459 nm(2.70 eV)变为487 nm(2.54 eV)。这可以通过在WO₃的导带和价带之间形成新的中间N 2p轨道导致WO₃-DDA的带隙变窄来解释。在450℃下煅烧的WO₃-DDA包覆的氧化铟锡(ITO)电极,由于光电化学水氧化,在低于490 nm的可见光照射下产生光阳极电流,而ITO/WO₃-本体在低于470 nm时产生光阳极电流。由于N的插入和WO₃-DDA的介孔结构,在420 nm和相对于Ag/AgCl为0.5 V时的入射光子到电流转换效率(IPCE = 24.5%)比ITO/WO₃-本体的2.5%高一个数量级。

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