Qiao Song-Jie, Xu Xiang-Nan, Qiu Yang, Xiao He-Chong, Zhu Yue-Feng
School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China.
Key Laboratory for Advanced Materials Processing Technology, Ministry of Education, Beijing 100084, China.
Nanomaterials (Basel). 2016 Feb 4;6(2):29. doi: 10.3390/nano6020029.
Graphene oxide (GO) was functionalized and reduced simultaneously by a new reductant, 4-hydrazinobenzenesulfonic acid (HBS), with a one-step and environmentally friendly process. The hydrophilic sulfonic acid group in HBS was grafted onto the surface of GO through a covalent bond. The successful preparation of HBS reduced GO (HBS-rGO) was testified by scanning electron microscope (SEM), X-ray diffraction (XRD), Raman spectroscopy, Fourier transform infrared spectra (FTIR), X-ray photoelectron spectroscopic (XPS) and thermogravimetric analysis (TGA). The interlayer space of HBS-rGO was increased to 1.478 nm from 0.751 nm for GO, resulting in a subdued Van der Waals' force between layers and less possibility to form aggregations. The aqueous dispersibility of graphene was improved to 13.49 mg/mL from 0.58 mg/mL after the functionalization. The viscosity of the epoxy resin based HBS-rGO composite could be regulated by an adjustment of the content of HBS-rGO. This study provides a new and applicable approach for the preparation of hydrophilic functionalized graphene, and makes it possible for the application of graphene in some functional polymer nanocomposites, such as specialty water-based coatings.
采用新型还原剂4-肼基苯磺酸（HBS），通过一步法且环境友好的工艺，对氧化石墨烯（GO）进行功能化和还原处理。HBS中的亲水性磺酸基团通过共价键接枝到GO表面。通过扫描电子显微镜（SEM）、X射线衍射（XRD）、拉曼光谱、傅里叶变换红外光谱（FTIR）、X射线光电子能谱（XPS）和热重分析（TGA）证实了HBS还原氧化石墨烯（HBS-rGO）的成功制备。HBS-rGO的层间距从GO的0.751 nm增加到1.478 nm，导致层间范德华力减弱，形成团聚的可能性降低。功能化后，石墨烯在水中的分散性从0.58 mg/mL提高到13.49 mg/mL。基于环氧树脂的HBS-rGO复合材料的粘度可通过调整HBS-rGO的含量来调节。本研究为亲水性功能化石墨烯的制备提供了一种新的适用方法，并使石墨烯在一些功能性聚合物纳米复合材料（如特种水性涂料）中的应用成为可能。
