Padilla J A, Xuriguera E, Rodríguez L, Vannozzi A, Segarra M, Celentano G, Varela M
IN2UB, DIOPMA, Department of Materials Science and Physical Chemistry, Universitat de Barcelona, Martí i Franquès 1, 08028, Barcelona, Spain.
La Farga Lacambra SAU, Ctra. C17z Km. 73, 5, 08508 Les Masies de Voltregà, Barcelona, Spain.
Nanoscale Res Lett. 2017 Dec;12(1):226. doi: 10.1186/s11671-017-1997-9. Epub 2017 Mar 28.
The growth of epitaxial {001}<100> SrTiO (STO) on low-cost cube-textured Cu-based clad substrate at low temperature was carried out by means of pulsed laser deposition (PLD). STO film was deposited in one step under a reducing atmosphere (5% H and 95% Ar mixture) to prevent the oxidation of the metal surface. The optimization of PLD parameters leads to a sharpest biaxial texture at a temperature as low as 500 °C and a thickness of 500 nm with a (100) STO layer. The upper limit of highly textured STO thickness was also investigated. The maximum thickness which retains the best quality {001}<100> texture is 800 nm, since the texture is preserved not only through the layer but also on the surface. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) measurements showed that STO films are continuous, dense, and smooth with very low roughness (between 5 and 7 nm). This paper describes the development of STO layer by means of PLD in absence of oxygen throughout the process, suggesting an alternative and effective method for growing highly {001}<100> textured STO layer on low-cost metal substrates.
通过脉冲激光沉积（PLD）在低温下于低成本的立方织构铜基复合衬底上生长外延{001}<100> SrTiO（STO）。在还原气氛（5% H和95% Ar混合气体）下一步沉积STO薄膜，以防止金属表面氧化。PLD参数的优化使得在低至500 °C的温度下、500 nm厚度且具有（100）STO层时获得最尖锐的双轴织构。还研究了高度织构化的STO厚度的上限。保持最佳质量{001}<100>织构的最大厚度为800 nm，因为不仅整个层而且表面都保持了织构。原子力显微镜（AFM）和扫描电子显微镜（SEM）测量表明，STO薄膜是连续、致密且光滑的，粗糙度非常低（在5至7 nm之间）。本文描述了在整个过程中无氧条件下通过PLD生长STO层的情况，这为在低成本金属衬底上生长高度{001}<100>织构的STO层提供了一种替代且有效的方法。
