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SnO/CuPc半导体异质结构中的电荷转移定量分析:通过光电子能谱研究掩埋界面的能量结构

Charge transfer quantification in a SnO/CuPc semiconductor heterostructure: investigation of buried interface energy structure by photoelectron spectroscopies.

作者信息

Krzywiecki Maciej, Grządziel Lucyna, Sarfraz Adnan, Erbe Andreas

机构信息

Max-Planck-Institut für Eisenforschung GmbH, Max-Planck-Str. 1, 40237 Düsseldorf, Germany.

出版信息

Phys Chem Chem Phys. 2017 May 17;19(19):11816-11824. doi: 10.1039/c7cp01688c.

DOI:10.1039/c7cp01688c
PMID:28470285
Abstract

A tin oxide/copper phthalocyanine (CuPc) layer stack was investigated with two complementary photoemission methods. Non-destructive analysis of the electronic properties at the SnO/CuPc interface was performed applying angle-dependent measurements with X-ray photoelectron spectroscopy (ADXPS) and energy-resolved photoemission yield spectroscopy (PYS). The different components (related to oxide layer and organic overlayer as well as to contamination features) observed in the spectra were assigned to a particular layer by relative depth plot analysis. ADXPS allowed determination of the chemical and electronic structure of the investigated samples. The addition of the organic ultra-thin film to the oxide layer caused a significant increase of the structure's photoemission yield. The combination of ADXPS and PYS allowed determination of the work function of constituent layers, and charge transfer phenomena at the SnO/CuPc buried interface. An interface dipole of 0.23 eV was detected, assigned to charge transfer across the interface from the oxide layer towards the organic film. The energy level alignment at the SnO/CuPc interface was determined, and presented in a band-like diagram, together with depth-dependent changes of the core energy levels of the structure's constituents. Finally the role of the oxide's defect-related energy levels in the charge transfer was discussed. The results obtained exhibit significance ranging from investigation, basic understanding and application of such hybrid films. Application of these results in hybrid electronic devices can help understanding and furthering this technology.

摘要

采用两种互补的光发射方法对氧化锡/铜酞菁(CuPc)层堆叠结构进行了研究。利用X射线光电子能谱(ADXPS)的角度相关测量和能量分辨光发射产额光谱(PYS)对SnO/CuPc界面的电子性质进行了无损分析。通过相对深度图分析将光谱中观察到的不同成分(与氧化层、有机覆盖层以及污染特征有关)归属于特定的层。ADXPS能够确定所研究样品的化学和电子结构。向氧化层添加有机超薄膜会导致该结构的光发射产额显著增加。ADXPS和PYS的结合能够确定组成层的功函数以及SnO/CuPc掩埋界面处的电荷转移现象。检测到一个0.23 eV的界面偶极,归因于电荷从氧化层向有机膜跨界面转移。确定了SnO/CuPc界面处的能级排列,并以能带图的形式呈现,同时还给出了该结构组成成分的芯能级随深度的变化。最后讨论了氧化物中与缺陷相关的能级在电荷转移中的作用。所获得的结果在这类混合薄膜的研究、基本理解和应用方面都具有重要意义。将这些结果应用于混合电子器件有助于理解和推动这项技术的发展。

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