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酞菁铜:其掺杂效应及其在柔性器件中应用的有机半导体性能研究。

CuPc: Effects of its Doping and a Study of Its Organic-Semiconducting Properties for Application in Flexible Devices.

作者信息

Leyva Esqueda Mariel, Sánchez Vergara María Elena, Álvarez Bada José Ramón, Salcedo Roberto

机构信息

Facultad de Ingeniería, Universidad Anáhuac México Norte, Avenida Universidad Anáhuac 46, Col. Lomas Anáhuac, Huixquilucan 52786, Estado de México, Mexico.

Instituto de Química, Universidad Nacional Autónoma de México, Circuito Exterior S/N, Ciudad Universitaria, Coyoacán 04510, Ciudad de México, Mexico.

出版信息

Materials (Basel). 2019 Jan 31;12(3):434. doi: 10.3390/ma12030434.

Abstract

This study refers to the doping of organic semiconductors by a simple reaction between copper phthalocyanine and tetrathiafulvalene or tetracyanoquinodimethane. The semiconductor films of copper phthalocyanine, doped with tetrathiafulvalene donor (CuPc-TTF) and tetracyanoquinodimethane acceptor (CuPc-TCNQ) on different substrates, were prepared by vacuum evaporation. The structure and morphology of the semiconductor films were studied with infrared (IR) spectroscopy, X-ray diffraction (XRD), and scanning electron microscopy (SEM). The absorption spectra for CuPc-TTF, recorded in the 200⁻900 nm UV⁻vis region for the deposited films, showed two peaks: a high energy peak, around 613 nm, and a second one, around 695 nm, with both peaks corresponding to the Q-band transition of the CuPcs. From the spectra, it can also be seen that CuPc-TTF has a B-band at around 330 nm and has a bandgap of approximately 1.4 eV. The B-band in the CuPc-TCNQ spectrum is quite similar to that of CuPc-TTF; on the other hand, CuPc-TCNQ does not include a Q-band in its spectrum and its bandgap value is of approximately 1.6 eV. The experimental optical bandgaps were compared to the ones calculated through density functional theory (DFT). In order to prove the effect of dopants in the phthalocyanine semiconductor, simple devices were manufactured and their electric behaviors were evaluated. Devices constituted by the donor-acceptor active layer and by the hollow, electronic-transport selective layers, were deposited on rigid and flexible indium tin oxide (ITO) substrates by the vacuum sublimation method. The current⁻voltage characteristics of the investigated structures, measured in darkness and under illumination, show current density values of around 10 A/cm² for the structure based on a mixed-PET layer and values of 3 A/cm² for the stacked-glass layered structure. The electrical properties of the devices, such as carrier mobility (μ) were obtained from the J⁻V characteristics. The mobility values of the devices on glass were between 1.59 × 10⁸ and 3.94 × 10 cm²/(V·s), whereas the values of the devices on PET were between 1.84 × 10⁸ and 4.51 × 10⁸ cm²/(V·s). The different behaviors of the rigid and flexible devices is mainly due to the effect of the substrate.

摘要

本研究涉及通过铜酞菁与四硫富瓦烯或四氰基对苯二醌二甲烷之间的简单反应对有机半导体进行掺杂。通过真空蒸发在不同衬底上制备了掺杂有四硫富瓦烯供体(CuPc-TTF)和四氰基对苯二醌二甲烷受体(CuPc-TCNQ)的铜酞菁半导体薄膜。利用红外(IR)光谱、X射线衍射(XRD)和扫描电子显微镜(SEM)研究了半导体薄膜的结构和形貌。对于沉积薄膜在200⁻900 nm紫外可见区域记录的CuPc-TTF吸收光谱显示出两个峰:一个高能峰,约在613 nm处,另一个在约695 nm处,这两个峰均对应于铜酞菁的Q带跃迁。从光谱中还可以看出,CuPc-TTF在约330 nm处有一个B带,带隙约为1.4 eV。CuPc-TCNQ光谱中的B带与CuPc-TTF的非常相似;另一方面,CuPc-TCNQ光谱中不包含Q带,其带隙值约为1.6 eV。将实验光学带隙与通过密度泛函理论(DFT)计算得到的带隙进行了比较。为了证明掺杂剂在酞菁半导体中的作用,制造了简单器件并评估了它们的电学行为。由供体-受体活性层和中空的电子传输选择性层构成的器件,通过真空升华法沉积在刚性和柔性氧化铟锡(ITO)衬底上。在黑暗和光照条件下测量的所研究结构的电流⁻电压特性表明,基于混合聚对苯二甲酸乙二酯(PET)层的结构的电流密度值约为10 A/cm²,而堆叠玻璃层状结构的电流密度值为3 A/cm²。器件的电学性质,如载流子迁移率(μ),是从J⁻V特性中获得的。玻璃上器件的迁移率值在1.59×10⁻⁸至3.94×10⁻⁸ cm²/(V·s)之间,而PET上器件的迁移率值在1.84×10⁻⁸至4.51×10⁻⁸ cm²/(V·s)之间。刚性和柔性器件的不同行为主要归因于衬底的影响。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/2218/6384798/795253b4b584/materials-12-00434-g001.jpg

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