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用于人体重复性开放涂抹试验无观察到不良反应水平(NOEL)数据的皮肤致敏定量构效关系模型:醛 Schiff 碱结构域

Skin Sensitization QMM for HRIPT NOEL Data: Aldehyde Schiff-Base Domain.

作者信息

Roberts David W, Schultz Terry W, Api Anne Marie

机构信息

School of Pharmacy and Biomolecular Sciences, Liverpool John Moores University , Liverpool L3 3AF, United Kingdom.

College of Veterinary Medicine, The University of Tennessee , 2407 River Drive, Knoxville, Tennessee 37996, United States.

出版信息

Chem Res Toxicol. 2017 Jun 19;30(6):1309-1316. doi: 10.1021/acs.chemrestox.7b00050. Epub 2017 May 24.

Abstract

The general chemistry principles underlying skin sensitization for Schiff base (SB) electrophiles may be used to develop a quantitative mechanistic model (QMM), based on reactivity supplemented with a hydrophobicity parameter for some but not all structures within the SB reaction domain. For aliphatic Schiff base electrophiles, the log of the no observed effect level (NOEL) values (pNOEL) from the human repeated insult patch test (HRIPT) can be calculated by the reactivity parameter summation of sigma star values (Σσ*) and a hydrophobicity parameter (logP). Specifically, the QMM, pNOEL = 2.34(±0.33) Σσ* + 0.19(±0.07) logP - 2.62(±0.22), n = 19, R = 0.77, R = 0.74, s = 0.20, F = 27, was developed. Not all parts of the Schiff base domain are modeled with one equation. Particularly, predicting aromatic aldehydes and ketones appears to require a separate equation. Interestingly, the same physical organic chemical properties originally applied to modeling the local lymph node assay potency of Schiff base electrophiles apply to human potency as represented by the HRIPT.

摘要

席夫碱(SB)亲电试剂引起皮肤致敏的一般化学原理可用于建立一个定量机理模型(QMM),该模型基于反应活性,并为SB反应域内的部分(而非全部)结构补充一个疏水性参数。对于脂肪族席夫碱亲电试剂,人类重复性损伤斑贴试验(HRIPT)的未观察到效应水平(NOEL)值的对数(pNOEL)可通过σ值(Σσ)的反应活性参数总和与一个疏水性参数(logP)来计算。具体而言,建立了如下QMM:pNOEL = 2.34(±0.33) Σσ* + 0.19(±0.07) logP - 2.62(±0.22),n = 19,R = 0.77,R² = 0.74,s = 0.20,F = 2

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