Zhang H, Das I
Indiana University- School of Medicine, Indianapolis, IN.
Med Phys. 2012 Jun;39(6Part14):3775. doi: 10.1118/1.4735397.
To evaluate the dose perturbation associated with thin layers of high-Z materials in HDR 192I source dose delivery through Monte Carlo simulation and experimental measurement.
Dose perturbation of high-Z thin materials in HDR 192Ir source dose delivery was experimentally and theoretically studied. MCNP5 Monte Carlo simulation code was employed to calculate the dose enhancement effects at upstream and downstream of high-Z materials. The cutoff energy for photon was 1 keV and for electron 5 keV. A parallel plate ion chamber with window thickness of 0.9 mm, was used to measure the dose rates at the downstream of the high-Z thin layer. The high-Z layer was positioned at 0.625 cm from the 192Ir source. The thickness of layer was from 0.1 to 1 mm. The results were normalized by the dose rate in a homogeneous water phantom at the location of the interface. The high-Z materials used were lead, tin and titanium. In addition, the dose enhancement effects of different high-Z materials at the shortest distance from the interface were also calculated and measured to examine the Z dependence.
The Monte Carlo simulation results agreed very well with the experimental data. At the surface of the 0.1 mm high-Z interface, Ti, Sn and Pb respectively increase dose rate by 1.2, 1.4 and 2.5 times the dose rate in homogeneous water medium. The dose rate enhancement depends on Z and thickness of the high-Z layer. The dose enhancement increases with Z. However, an increased thickness in the high- Z layer results in less dose enhancement due to attenuation.
HDR 192Ir source dose enhancement by a high-Z material thin layer is similar to that reported from a kilo-voltage X-ray beam. Attention should be paid for high-Z thin layers with HDR source clinically as it could cause significant dose enhancement.
通过蒙特卡罗模拟和实验测量,评估高原子序数材料薄层在高剂量率近距离治疗(HDR)192I源剂量传递过程中引起的剂量扰动。
对高原子序数薄材料在HDR 192Ir源剂量传递中的剂量扰动进行了实验和理论研究。采用MCNP5蒙特卡罗模拟代码计算高原子序数材料上游和下游的剂量增强效应。光子的截止能量为1 keV,电子的截止能量为5 keV。使用窗口厚度为0.9 mm的平行板电离室测量高原子序数薄层下游的剂量率。高原子序数层位于距192Ir源0.625 cm处。层的厚度为0.1至1 mm。结果通过在界面位置的均匀水体模中的剂量率进行归一化。使用的高原子序数材料为铅、锡和钛。此外,还计算并测量了不同高原子序数材料在距界面最短距离处的剂量增强效应,以研究其对原子序数的依赖性。
蒙特卡罗模拟结果与实验数据非常吻合。在0.1 mm高原子序数界面的表面,钛、锡和铅分别使剂量率比均匀水介质中的剂量率提高1.2倍、1.4倍和2.5倍。剂量率增强取决于高原子序数层的原子序数和厚度。剂量增强随原子序数增加而增加。然而,由于衰减,高原子序数层厚度增加会导致剂量增强减少。
高原子序数材料薄层对HDR 192Ir源的剂量增强与千伏X射线束报道的情况相似。临床上使用HDR源时应注意高原子序数薄层,因为它可能会导致显著的剂量增强。