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具有 InP 钝化层的 InAs 纳米线光致发光发射的十倍增强。

Ten-Fold Enhancement of InAs Nanowire Photoluminescence Emission with an InP Passivation Layer.

机构信息

Department of Electronic and Electrical Engineering, University College London , London WC1E 7JE, United Kingdom.

Department of Physics, University of Warwick , Coventry CV4 7AL, United Kingdom.

出版信息

Nano Lett. 2017 Jun 14;17(6):3629-3633. doi: 10.1021/acs.nanolett.7b00803. Epub 2017 Jun 1.

DOI:10.1021/acs.nanolett.7b00803
PMID:28535064
Abstract

In this Letter, we demonstrate that a significant improvement of optical performance of InAs nanowires can be achieved by capping the core InAs nanowires with a thin InP shell, which successfully passivates the surface states reducing the rate of nonradiative recombination. The improvements have been confirmed by detailed photoluminescence measurements, which showed up to a 10-fold increase in the intensity of room-temperature photoluminescence from the capped InAs/InP nanowires compared to the sample with core-only InAs nanowires. Moreover, the nanowires exhibit a high stability of total photoluminescence emission strength across temperature range from 10 to 300 K as a result of strong quantum confinement. These findings could be the key to successful implementation of InAs nanowires into optoelectronic devices.

摘要

在这封信件中,我们证明了通过在核心 InAs 纳米线外覆盖一层薄薄的 InP 壳,可以显著提高 InAs 纳米线的光学性能,从而成功钝化表面态,降低非辐射复合速率。详细的光致发光测量证实了这一点,与仅含有核心 InAs 纳米线的样品相比,覆盖有 InAs/InP 纳米线的样品在室温下的光致发光强度提高了 10 倍。此外,由于强量子限制,纳米线在 10 到 300 K 的温度范围内表现出总光致发光发射强度的高稳定性。这些发现可能是成功将 InAs 纳米线应用于光电器件的关键。

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Nano Lett. 2017 Jun 14;17(6):3629-3633. doi: 10.1021/acs.nanolett.7b00803. Epub 2017 Jun 1.
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Self-Seeded MOCVD Growth and Dramatically Enhanced Photoluminescence of InGaAs/InP Core-Shell Nanowires.
自种子分子束外延生长及InGaAs/InP核壳纳米线光致发光的显著增强
Nanoscale Res Lett. 2018 Sep 5;13(1):269. doi: 10.1186/s11671-018-2690-3.