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聚合物残留对大面积石墨烯-六方氮化硼平面异质结电性能的影响。

Effect of polymer residues on the electrical properties of large-area graphene-hexagonal boron nitride planar heterostructures.

机构信息

Energy & Transportation Science Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, United States of America.

出版信息

Nanotechnology. 2017 Jul 14;28(28):285601. doi: 10.1088/1361-6528/aa7589. Epub 2017 May 30.

Abstract

Polymer residue plays an important role in the performance of 2D heterostructured materials. Herein, we study the effect of polymer residual impurities on the electrical properties of graphene-boron nitride planar heterostructures. Large-area graphene (Gr) and hexagonal boron nitride (h-BN) monolayers were synthesized using chemical vapor deposition techniques. Atomic van-der-Waals heterostructure layers based on varied configurations of Gr and h-BN layers were assembled. The average interlayer resistance of the heterojunctions over a 1 cm area for several planar heterostructure configurations was assessed by impedance spectroscopy and modeled by equivalent electrical circuits. Conductive AFM measurements showed that the presence of polymer residues on the surface of the Gr and h-BN monolayers resulted in significant resistance deviations over nanoscale regions.

摘要

聚合物残留对 2D 异质结构材料的性能起着重要作用。在此,我们研究了聚合物残留杂质对石墨烯-氮化硼平面异质结构的电学性质的影响。使用化学气相沉积技术合成了大面积石墨烯 (Gr) 和六方氮化硼 (h-BN) 单层。基于 Gr 和 h-BN 层的不同配置组装了原子范德华异质结构层。通过阻抗谱评估了几种平面异质结构配置下 1cm2 面积上异质结的平均层间电阻,并通过等效电路模型进行了模拟。导电原子力显微镜测量表明,Gr 和 h-BN 单层表面聚合物残留的存在导致纳米级区域的电阻显著偏离。

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