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六方氮化硼-石墨烯杂化结构:合成与界面性质。

Hexagonal Boron Nitride-Graphene Heterostructures: Synthesis and Interfacial Properties.

机构信息

Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Sciences, College of Chemistry and Molecular Engineering, Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, P. R. China.

National Center for Nanoscience and Technology, Chinese Academy of Sciences, Beijing, 100190, P. R. China.

出版信息

Small. 2016 Jan 6;12(1):32-50. doi: 10.1002/smll.201501766. Epub 2015 Oct 6.

Abstract

Research on in-plane and vertically-stacked heterostructures of graphene and hexagonal boron nitride (h-BN) have attracted intense attentions for energy band engineering and device performance optimization of graphene. In this review article, recent advances in the controlled syntheses, interfacial structures, and electronic properties, as well as novel device constructions of h-BN and graphene heterostructures are highlighted. Firstly, diverse synthesis approaches for in-plane h-BN and graphene (h-BN-G) heterostructures are reviewed, and their applications in nanoelectronics are briefly introduced. Moreover, the interfacial structures and electronic properties of h-BN-G heterojunctions are discussed, and a zigzag type interface is found to preferentially evolve at the linking edge of the two structural analogues. Secondly, several synthetic routes for the vertically-stacked graphene/h-BN (G/h-BN) heterostructures are also reviewed. The role of h-BN as perfect dielectric layers in promoting the device performance of graphene is presented. Finally, future research directions in the synthesis and application of such heterostructures are discussed.

摘要

石墨烯和六方氮化硼(h-BN)的面内和垂直堆叠异质结构的研究引起了人们对石墨烯能带工程和器件性能优化的极大关注。在这篇综述文章中,重点介绍了 h-BN 和石墨烯异质结构的可控合成、界面结构和电子特性以及新型器件结构的最新进展。首先,综述了面内 h-BN 和石墨烯(h-BN-G)异质结构的多种合成方法,并简要介绍了它们在纳米电子学中的应用。此外,讨论了 h-BN-G 异质结的界面结构和电子特性,发现两种结构类似物的连接边缘优先演化出锯齿型界面。其次,还综述了几种垂直堆叠的石墨烯/ h-BN(G/h-BN)异质结构的合成途径。阐述了 h-BN 作为理想介电层在提高石墨烯器件性能方面的作用。最后,讨论了这种异质结构的合成和应用的未来研究方向。

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