State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University , 2699 Qianjin Street, Changchun 130012, People's Republic of China.
College of Instrumentation & Electrical Engineering, Jilin University , 938 Ximinzhu Street, Changchun 130061, People's Republic of China.
ACS Appl Mater Interfaces. 2017 Jul 5;9(26):22068-22075. doi: 10.1021/acsami.7b06235. Epub 2017 Jun 21.
To overcome drawbacks of the electron transport layer, such as complex surface defects and unmatched energy levels, we successfully employed a smart semiconductor-metal interfacial nanojunciton in organic solar cells by evaporating an ultrathin Al interlayer onto annealing-free ZnO electron transport layer, resulting in a high fill factor of 73.68% and power conversion efficiency of 9.81%. The construction of ZnO-Al nanojunction could effectively fill the surface defects of ZnO and reduce its work function because of the electron transfer from Al to ZnO by Fermi level equilibrium. The filling of surface defects decreased the interfacial carrier recombination in midgap trap states. The reduced surface work function of ZnO-Al remodulated the interfacial characteristics between ZnO and [6,6]-phenyl C71-butyric acid methyl ester (PCBM), decreasing or even eliminating the interfacial barrier against the electron transport, which is beneficial to improve the electron extraction capacity. The filled surface defects and reduced interfacial barrier were realistically observed by photoluminescence measurements of ZnO film and the performance of electron injection devices, respectively. This work provides a simple and effective method to simultaneously solve the problems of surface defects and unmatched energy level for the annealing-free ZnO or other metal oxide semiconductors, paving a way for the future popularization in photovoltaic devices.
为了克服电子传输层的缺点,如复杂的表面缺陷和不匹配的能级,我们通过在无退火 ZnO 电子传输层上蒸镀超薄 Al 层,成功地在有机太阳能电池中采用了智能半导体-金属界面纳结,得到了 73.68%的高填充因子和 9.81%的功率转换效率。ZnO-Al 纳结的构建可以通过费米能级平衡有效地填充 ZnO 的表面缺陷并降低其功函数,因为电子从 Al 转移到 ZnO。表面缺陷的填充减少了中间隙陷阱态中的界面载流子复合。降低的 ZnO-Al 表面功函数重塑了 ZnO 和[6,6]-苯基 C71-丁酸甲酯(PCBM)之间的界面特性,降低甚至消除了电子传输的界面势垒,有利于提高电子提取能力。通过 ZnO 薄膜的光致发光测量和电子注入器件的性能,分别实际观察到填充的表面缺陷和降低的界面势垒。这项工作为无退火 ZnO 或其他金属氧化物半导体同时解决表面缺陷和不匹配能级问题提供了一种简单有效的方法,为未来在光伏器件中的推广铺平了道路。