Vieira Luciana, Burt Jennifer, Richardson Peter W, Schloffer Daniel, Fuchs David, Moser Alwin, Bartlett Philip N, Reid Gillian, Gollas Bernhard
Institute for Chemistry and Technology of Materials Graz University of Technology Stremayrgasse 98010 Graz Austria.
Chemistry, University of Southampton, Highfield University Road Southampton SO17 1BJ UK.
ChemistryOpen. 2017 Apr 13;6(3):393-401. doi: 10.1002/open.201700045. eCollection 2017 Jun.
The electrodeposition of tin, bismuth, and tin-bismuth alloys from Sn and Bi chlorometalate salts in the choline chloride/ethylene glycol (1:2 molar ratio) deep eutectic solvent was studied on glassy carbon and gold by cyclic voltammetry, rotating disc voltammetry, and chronoamperometry. The Sn-containing electrolyte showed one voltammetric redox process corresponding to Sn/Sn. The diffusion coefficient of [SnCl], detected as the dominating species by Raman spectroscopy, was determined from Levich and Cottrell analyses. The Bi-containing electrolyte showed two voltammetric reduction processes, both attributed to Bi/Bi. Dimensionless current/time transients revealed that the electrodeposition of both Sn and Bi on glassy carbon proceeded by 3D-progressive nucleation at a low overpotential and changed to instantaneous at higher overpotentials. The nucleation rate of Bi on glassy carbon was considerably smaller than that of Sn. Elemental Sn and Bi were electrodeposited on Au-coated glass slides from their respective salt solutions, as were Sn-Bi alloys from a 2:1 Sn/Bi solution. The biphasic Sn-Bi alloys changed from a Bi-rich composition to a Sn-rich composition by making the deposition potential more negative.
采用循环伏安法、旋转圆盘伏安法和计时电流法，在玻璃碳电极和金电极上研究了在氯化胆碱/乙二醇（摩尔比1:2）的低共熔溶剂中，从锡和铋的氯金属酸盐中电沉积锡、铋及锡-铋合金的过程。含锡电解质显示出一个对应于Sn/Sn的伏安氧化还原过程。通过拉曼光谱检测为主要物种的[SnCl]的扩散系数，由列维奇分析和科特雷尔分析确定。含铋电解质显示出两个伏安还原过程，均归因于Bi/Bi。无量纲电流/时间瞬变表明，锡和铋在玻璃碳上的电沉积在低过电位下通过三维渐进形核进行，在较高过电位下转变为瞬时形核。铋在玻璃碳上的形核速率明显小于锡。元素锡和铋从各自的盐溶液中电沉积在镀金载玻片上，2:1的Sn/Bi溶液也能电沉积出锡-铋合金。通过使沉积电位更负，双相锡-铋合金从富铋成分转变为富锡成分。
