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铁电液晶中部分展开螺旋结构的介电弛豫过程。

Dielectric relaxation process of a partially unwound helical structure in ferroelectric liquid crystals.

机构信息

Physics Department, Deshbandhu College (University of Delhi, Delhi), Kalkaji, New Delhi 110019, India.

CSIR-Academy of Scientific and Innovative Research (AcSIR), Taramani, Chennai 600113, India.

出版信息

Phys Rev E. 2017 Jun;95(6-1):062702. doi: 10.1103/PhysRevE.95.062702. Epub 2017 Jun 8.

Abstract

The fluctuations of unwound helical structure have been observed in deformed helix ferroelectric liquid crystal (DHFLC) and conventional FLC sample cells. The helix is partially unwound by strong anchoring on the substrates. In such sample cells, the helical decarlization lines are not observed in the texture under crossed polarized microscope. The dielectric spectroscopy is employed to observe the behavior of dielectric relaxation processes in these sample cells. A dielectric relaxation process is observed at a lower frequency than the Goldstone mode processes in DHFLC and FLC, which we call partially unwound helical mode (p-UHM). However, the p-UHM process is not observed in the sample cell in which the helical lines appear. The application of various amplitudes of probing ac voltages on this mode has shown the higher frequency shift, i.e., the larger the amplitude of ac voltage, the higher is the relaxation frequency of p-UHM. At sufficient amplitude of applied probing ac voltage, the p-UHM merges with the Goldstone mode process and is difficult to detect. However, the Goldstone mode relaxation frequency is almost independent of the cell geometry and sample configuration. The electro-optical behavior of the p-UHM has also been confirmed by electro-optical technique. The dielectric relaxation of UHM at a frequency lower than the Goldstone mode is interpreted as the fluctuation of partially unwound helix.

摘要

在变形螺旋铁电液晶 (DHFLC) 和常规 FLC 样品池中观察到未缠绕螺旋结构的波动。螺旋结构在基底上的强锚定作用下部分解绕。在这种样品池中,在交叉偏振显微镜下的织构中观察不到螺旋去磁化线。介电谱用于观察这些样品池中的介电弛豫过程的行为。在 DHFLC 和 FLC 中低于 Goldstone 模式过程的较低频率下观察到介电弛豫过程,我们称之为部分解绕螺旋模式 (p-UHM)。然而,在出现螺旋线的样品池中未观察到 p-UHM 过程。对该模式施加不同幅度的探测交流电压的应用表明了更高的频率偏移,即交流电压的幅度越大,p-UHM 的弛豫频率越高。在施加的探测交流电压的足够幅度下,p-UHM 与 Goldstone 模式过程合并,难以检测。然而,Goldstone 模式弛豫频率几乎与单元几何形状和样品配置无关。电光学技术也证实了 p-UHM 的电光行为。低于 Goldstone 模式的 UHM 的介电弛豫被解释为部分解绕螺旋的波动。

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