Sirikumara Hansika I, Jayasekera Thushari
Department of Physics, Southern Illinois University, Carbondale, IL 62901, United States of America.
J Phys Condens Matter. 2017 Oct 25;29(42):425501. doi: 10.1088/1361-648X/aa81a6. Epub 2017 Jul 24.
Tin selenide (SnSe) is one of the best thermoelectric materials reported to date. The possibility of growing few-layer SnSe helped boost the interest in this long-known, earth abundant material. Pristine SnSe in bulk, mono- and few-layer forms are reported to have indirect electronic bandgaps. Possible indirect-direct transition in SnSe is attractive for its optoelectronic-related applications. Based on the results from first principles density functional theory calculations, we carefully analyzed electronic band structures of bulk, and bilayer SnSe with various interlayer stackings. We report the possible stacking-dependent indirect-direct transition of bilayer SnSe. By further analysis, our results reveal that it is the directionality of interlayer interactions that determine the critical features of their electronic band structures. In fact, by engineering the interface stacking between layers, it is possible to achieve few-layer SnSe with direct electronic band gap. This study provides fundamental insights to design few-layer SnSe and SnSe heterostructures for electronic/optoelectronic applications, where the interface geometry plays a fundamental role in device performance.
硒化锡(SnSe)是迄今为止报道的最佳热电材料之一。生长少层SnSe的可能性激发了人们对这种早已为人所知且储量丰富的材料的兴趣。据报道,块状、单层和少层的纯净SnSe具有间接电子带隙。SnSe中可能的间接-直接跃迁因其与光电子相关的应用而备受关注。基于第一性原理密度泛函理论计算的结果,我们仔细分析了块状和具有各种层间堆叠的双层SnSe的电子能带结构。我们报道了双层SnSe可能存在的依赖于堆叠的间接-直接跃迁。通过进一步分析,我们的结果表明,是层间相互作用的方向性决定了其电子能带结构的关键特征。事实上,通过设计层间的界面堆叠,可以实现具有直接电子带隙的少层SnSe。这项研究为设计用于电子/光电子应用的少层SnSe和SnSe异质结构提供了基本见解,其中界面几何结构在器件性能中起着至关重要的作用。