High Temperature and Energy Materials Laboratory, Department of Metallurgical Engineering and Materials Science, Indian Institute of Technology (IIT) Bombay, Mumbai 400076, India.
Nanomaterials Laboratory, Department of Physics, Indian Institute of Technology (IIT) Bombay, Mumbai 400076, India.
Nanoscale. 2017 Aug 10;9(31):11303-11317. doi: 10.1039/c7nr03348f.
Wide differences in the structural features of graphenic carbon, especially in the case of reduced graphene oxides (rGO), are expected to have considerable impacts on the properties, thus leading to significant scatter and poor understanding/prediction of their performances for various applications, including as electrode materials for electrochemical Li-storage. In this context, the present work develops a comprehensive understanding (via thorough experimentation, including in situ X-ray diffraction studies, and analysis) on the effects of graphene oxide (GO) reduction methods/conditions on the structural features (mainly 'graphenic' ordering) and concomitant influences of the same on electrochemical Li-storage behavior. 'Moderately oxidized' GO (O/C ∼0.41) was reduced via three different methods, viz., (i) using hydrazine hydrate vapor at room temperature (rGO-H; O/C ∼0.23), (ii) thermal reduction by annealing at just 500 °C (rGO-A; O/C ∼0.20) and (iii) hydrazine treatment, followed by the same annealing treatment (rGO-HA; O/C ∼0.17). Raman spectroscopy, in situ X-ray diffraction recorded during annealing and high resolution TEM imaging indicate that while GO and rGO-H had considerable defect contents [I(D)/I(G) ∼1.4 for rGO-H], including a very non-uniform interlayer spacing (varying between 3.1 and 3.6 Å), the 500 °C annealed rGO-A and rGO-HA had significantly reduced defect contents [I(D)/I(G) ∼0.6] and near-perfect 'graphenic' ordering with a uniform interlayer spacing of ∼3.35 Å. Despite the nanoscaled dimensions, defect structures, especially the non-uniform interlayer spacing, resulted in relatively poor reversible Li-capacity and rate capability for the non-annealed rGO-H, even in comparison to the bulk graphitic carbon. By contrast, the annealed rGOs, especially the rGO-HA, not only possessed a superior reversible Li-capacity of ∼450 mA h g (at C/20), but also exhibited a significantly improved rate capability (even compared to most rGOs reported in the literature), retaining ∼120 mA h g along with flat potential profile (below ∼0.2 V against Li/Li) even at 10C (as possibly never reported before with graphitic/graphenic carbons).
石墨烯碳的结构特征存在很大差异,尤其是还原氧化石墨烯(rGO)的情况,这预计会对其性能产生重大影响,从而导致对其各种应用(包括作为电化学 Li 存储的电极材料)的性能的理解/预测产生很大的差异。在这种情况下,本工作通过全面的实验(包括原位 X 射线衍射研究和分析)来深入了解氧化石墨烯(GO)还原方法/条件对结构特征(主要是“石墨烯”有序性)的影响,以及相同条件对电化学 Li 存储行为的影响。“中度氧化”GO(O/C ∼0.41)通过三种不同的方法还原,即(i)在室温下使用水合肼蒸气(rGO-H;O/C ∼0.23),(ii)仅在 500°C 下退火还原(rGO-A;O/C ∼0.20)和(iii)水合肼处理,然后进行相同的退火处理(rGO-HA;O/C ∼0.17)。拉曼光谱、在退火过程中记录的原位 X 射线衍射和高分辨率 TEM 成像表明,虽然 GO 和 rGO-H 具有相当大的缺陷含量[I(D)/I(G)∼1.4 对于 rGO-H],包括非常不均匀的层间间距(在 3.1 和 3.6 Å 之间变化),但 500°C 退火的 rGO-A 和 rGO-HA 的缺陷含量显著降低[I(D)/I(G)∼0.6],并且具有近乎完美的“石墨烯”有序性,层间间距约为 3.35 Å。尽管具有纳米尺寸,但缺陷结构,特别是不均匀的层间间距,导致未经退火的 rGO-H 的可逆 Li 容量和倍率性能相对较差,即使与块状石墨碳相比也是如此。相比之下,退火的 rGO ,特别是 rGO-HA,不仅具有约 450 mA h g(在 C/20 时)的优越可逆 Li 容量,而且还表现出显著改善的倍率性能(即使与文献中报道的大多数 rGO 相比),在 10C 时保留约 120 mA h g ,并且具有平坦的电位曲线(低于相对于 Li/Li 的约 0.2 V),即使在以前从未报道过的石墨/石墨烯碳中也是如此。