Pásztor Á, Scarfato A, Renner Ch
DQMP, Université de Genève, 24 Quai Ernest Ansermet, CH-1211 Geneva, Switzerland.
Rev Sci Instrum. 2017 Jul;88(7):076104. doi: 10.1063/1.4993738.
Exfoliation, namely, the peeling of layered materials down to a single unit-cell thin foil, opens promising avenues to fabricate novel electronic materials. New properties and original functionalities emerge in the single and few layer configurations of a number of layered compounds, in particular in transition metal dichalcogenides. However, many of these thin exfoliated materials are very sensitive to ambient conditions impeding the exploration of this new and fascinating parameter space. Here we describe a method of mechanical exfoliation in ultra-high vacuum (UHV). This technique is easily adaptable to any UHV system and allows preparing and studying air sensitive nanoflakes in situ. We present the basic design and proof-of-concept scanning tunneling microscopy imaging of VSe nanoflakes.
剥离,即把层状材料剥离成单个晶胞厚度的薄片,为制造新型电子材料开辟了广阔前景。许多层状化合物在单层和少数层结构中展现出了新的性质和独特功能,特别是在过渡金属二硫属化物中。然而,许多这类剥离的薄材料对环境条件非常敏感,这阻碍了对这个崭新且迷人的参数空间的探索。在此,我们描述一种在超高真空(UHV)环境下的机械剥离方法。该技术易于适配任何超高真空系统,并能原位制备和研究对空气敏感的纳米薄片。我们展示了VSe纳米薄片的基本设计和概念验证扫描隧道显微镜成像。