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通过缺陷工程实现碳氧化硅的强发光增强

Strong Photoluminescence Enhancement of Silicon Oxycarbide through Defect Engineering.

作者信息

Ford Brian, Tabassum Natasha, Nikas Vasileios, Gallis Spyros

机构信息

Colleges of Nanoscale Science and Engineering, SUNY Polytechnic Institute, Albany, NY 12203, USA.

出版信息

Materials (Basel). 2017 Apr 23;10(4):446. doi: 10.3390/ma10040446.

DOI:10.3390/ma10040446
PMID:28772802
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC5506893/
Abstract

The following study focuses on the photoluminescence (PL) enhancement of chemically synthesized silicon oxycarbide (SiCO) thin films and nanowires through defect engineering via post-deposition passivation treatments. SiCO materials were deposited via thermal chemical vapor deposition (TCVD), and exhibit strong white light emission at room-temperature. Post-deposition passivation treatments were carried out using oxygen, nitrogen, and forming gas (FG, 5% H₂, 95% N₂) ambients, modifying the observed white light emission. The observed white luminescence was found to be inversely related to the carbonyl (C=O) bond density present in the films. The peak-to-peak PL was enhanced ~18 and ~17 times for, respectively, the two SiCO matrices, oxygen-rich and carbon-rich SiCO, via post-deposition passivations. Through a combinational and systematic Fourier transform infrared spectroscopy (FTIR) and PL study, it was revealed that proper tailoring of the passivations reduces the carbonyl bond density by a factor of ~2.2, corresponding to a PL enhancement of ~50 times. Furthermore, the temperature-dependent and temperature-dependent time resolved PL (TDPL and TD-TRPL) behaviors of the nitrogen and forming gas passivated SiCO thin films were investigated to acquire further insight into the ramifications of the passivation on the carbonyl/dangling bond density and PL yield.

摘要

以下研究聚焦于通过沉积后钝化处理进行缺陷工程,来增强化学合成的碳氧化硅(SiCO)薄膜和纳米线的光致发光(PL)。SiCO材料通过热化学气相沉积(TCVD)制备,并在室温下呈现出强烈的白光发射。使用氧气、氮气和形成气体(FG,5% H₂,95% N₂)环境进行沉积后钝化处理,改变了观察到的白光发射。发现观察到的白色发光与薄膜中存在的羰基(C=O)键密度成反比。通过沉积后钝化,富氧和富碳SiCO这两种SiCO基体的峰-峰PL分别增强了约18倍和约17倍。通过组合式系统傅里叶变换红外光谱(FTIR)和PL研究表明,适当调整钝化可使羰基键密度降低约2.2倍,对应PL增强约50倍。此外,对氮气和形成气体钝化的SiCO薄膜的温度依赖和温度依赖时间分辨PL(TDPL和TD-TRPL)行为进行了研究,以进一步深入了解钝化对羰基/悬空键密度和PL产率的影响。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/27c7/5506893/2010e8365a42/materials-10-00446-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/27c7/5506893/f9980dc4f340/materials-10-00446-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/27c7/5506893/c4e6258ca223/materials-10-00446-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/27c7/5506893/920049091568/materials-10-00446-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/27c7/5506893/49eed091e8ce/materials-10-00446-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/27c7/5506893/86cea6136cb9/materials-10-00446-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/27c7/5506893/2010e8365a42/materials-10-00446-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/27c7/5506893/f9980dc4f340/materials-10-00446-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/27c7/5506893/c4e6258ca223/materials-10-00446-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/27c7/5506893/920049091568/materials-10-00446-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/27c7/5506893/49eed091e8ce/materials-10-00446-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/27c7/5506893/86cea6136cb9/materials-10-00446-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/27c7/5506893/2010e8365a42/materials-10-00446-g006.jpg

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