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通过贝氏纳米压痕研究AlN薄膜中的位错能量学与突跳现象

Dislocation Energetics and Pop-Ins in AlN Thin Films by Berkovich Nanoindentation.

作者信息

Jian Sheng-Rui, Tseng Yu-Chin, Teng I-Ju, Juang Jenh-Yih

机构信息

Department of Materials Science and Engineering, I-Shou University, Main Campus: No.1, Sec. 1, Syuecheng Rd., Dashu District, Kaohsiung City 84001, Taiwan.

Centre for Interdisciplinary Science, National Chiao Tung University, Hsinchu 30010, Taiwan.

出版信息

Materials (Basel). 2013 Sep 23;6(9):4259-4267. doi: 10.3390/ma6094259.

Abstract

Nanoindentation-induced multiple pop-ins were observed in the load-displacement curves when the mechanical responses of AlN films grown on -plane sapphire substrates were investigated by using Berkovich indenters. No evidence of phase transformation is revealed by cross-sectional transmission electron microscopy (XTEM) and selected area diffraction (SAD) analyses. Instead XTEM observations suggest that these "instabilities" resulted from the sudden nucleation of dislocations propagating along the slip systems lying on the {0001} basal planes and the pyramidal planes commonly observed in hexagonal compound semiconductors. Based on this scenario, an energetic estimation of dislocation nucleation is made.

摘要

当使用贝氏压头研究在平面蓝宝石衬底上生长的AlN薄膜的力学响应时,在载荷-位移曲线中观察到了纳米压痕诱导的多次弹出。横截面透射电子显微镜(XTEM)和选区衍射(SAD)分析未发现相变的证据。相反,XTEM观察表明,这些“不稳定性”是由沿六方化合物半导体中常见的{0001}基面和锥面上的滑移系统传播的位错突然形核引起的。基于此情况,对位错形核进行了能量估计。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/df8b/5452654/25f6dac9969d/materials-06-04259-g001.jpg

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