Selvankumar T, Radhika R, Mythili R, Arunprakash S, Srinivasan P, Govarthanan M, Kim Hyunook
PG and Research Department of Biotechnology, Mahendra Arts and Science College (Autonomous), Kalippatti, Namakkal, Tamil Nadu 637501 India.
Department of Botany, Arignar Anna Government Arts College, Namakkal, Tamil Nadu 637002 India.
3 Biotech. 2017 Aug;7(4):264. doi: 10.1007/s13205-017-0901-8. Epub 2017 Jul 26.
The aim of the present study was to assess the arsenic (As) transformation potential of endophytic bacteria isolated from roots of plant. The endophytic bacterium was tested for minimal inhibitory concentration (MIC) against As. The endophytic strain RPT exhibited the highest resistance to As(V) (400 mg/l). Phylogenetic analysis of the 16S rRNA sequence suggested that strain RPT was a member of genus . The As transformation assay revealed As(III) oxidation and As(V) reduction potential of sp. RPT. The As resistance mechanism was further confirmed by amplification of and genes. The growth kinetics of strain RPT was altered slightly in the presence of different concentration (100-400 mg/l) of As stress. Temperature and pH influenced the As removal rate. The maximum As removal was observed at pH 7.0 (74%) and 37 °C (70.9%). The results suggest that strain RPT can survive under the As stress and has been identified as a potential candidate for application in bioremediation of As in contaminated environments.
本研究的目的是评估从植物根部分离出的内生细菌的砷(As)转化潜力。对该内生细菌进行了抗砷最低抑菌浓度(MIC)测试。内生菌株RPT对五价砷(As(V))表现出最高抗性(400毫克/升)。16S rRNA序列的系统发育分析表明,菌株RPT是某属的成员。砷转化试验揭示了RPT菌的三价砷(As(III))氧化和五价砷(As(V))还原潜力。通过扩增相关基因进一步证实了其抗砷机制。在不同浓度(100 - 400毫克/升)的砷胁迫下,菌株RPT的生长动力学略有改变。温度和pH值影响砷的去除率。在pH 7.0(74%)和37°C(70.9%)时观察到最大的砷去除量。结果表明,菌株RPT能够在砷胁迫下存活,并已被确定为受污染环境中砷生物修复应用的潜在候选菌株。