Baines Yannick, Buckley Julien, Biscarrat Jérôme, Garnier Gennie, Charles Matthew, Vandendaele William, Gillot Charlotte, Plissonnier Marc
Univ. Grenoble Alpes, F-38000, Grenoble, France.
CEA, LETI, MINATEC Campus, F-38054, Grenoble, France.
Sci Rep. 2017 Aug 15;7(1):8177. doi: 10.1038/s41598-017-08307-0.
Due to their wide band gaps, III-N materials can exhibit behaviors ranging from the semiconductor class to the dielectric class. Through an analogy between a Metal/AlGaN/AlN/GaN diode and a MOS contact, we make use of this dual nature and show a direct path to capture the energy band diagram of the nitride system. We then apply transparency calculations to describe the forward conduction regime of a III-N heterojunction diode and demonstrate it realizes a tunnel diode, in contrast to its regular Schottky Barrier Diode designation. Thermionic emission is ruled out and instead, a coherent electron tunneling scenario allows to account for transport at room temperature and higher.
由于其宽带隙,III族氮化物材料可呈现从半导体类到介电类的多种行为。通过将金属/氮化铝镓/氮化铝/氮化镓二极管与金属氧化物半导体(MOS)接触进行类比,我们利用这种双重特性,展示了一条获取氮化物系统能带图的直接途径。然后,我们应用透明度计算来描述III族氮化物异质结二极管的正向传导机制,并证明它实现了一个隧道二极管,这与其常规的肖特基势垒二极管不同。热电子发射被排除,取而代之的是,相干电子隧穿机制能够解释在室温及更高温度下的输运现象。