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二维 MoSe-WSe 横向异质结构的生长和同时谷操纵。

Growth and Simultaneous Valleys Manipulation of Two-Dimensional MoSe-WSe Lateral Heterostructure.

机构信息

Department of Physics, Chung-Ang University , Seoul 06794, South Korea.

Department of Physics, Sogang University , Seoul 04107, South Korea.

出版信息

ACS Nano. 2017 Sep 26;11(9):8822-8829. doi: 10.1021/acsnano.7b02914. Epub 2017 Aug 25.

DOI:10.1021/acsnano.7b02914
PMID:28825796
Abstract

The covalently bonded in-plane heterostructure (HS) of monolayer transition-metal dichalcogenides (TMDCs) possesses huge potential for high-speed electronic devices in terms of valleytronics. In this study, high-quality monolayer MoSe-WSe lateral HSs are grown by pulsed-laser-deposition-assisted selenization method. The sharp interface of the lateral HS is verified by morphological and optical characterizations. Intriguingly, photoluminescence spectra acquired from the interface show rather clear signatures of pristine MoSe and WSe with no intermediate energy peak related to intralayer excitonic matter or formation of MoWSe alloys, thereby confirming the sharp interface. Furthermore, the discrete nature of laterally attached TMDC monolayers, each with doubly degenerated but nonequivalent energy valleys marked by (K, K') for MoSe and (K, K') for WSe in k space, allows simultaneous control of the four valleys within the excitation area without any crosstalk effect over the interface. As an example, K and K valleys or K' and K' valleys are simultaneously polarized by controlling the helicity of circularly polarized optical pumping, where the maximum degree of polarization is achieved at their respective band edges. The current work provides the growth mechanism of laterally sharp HSs and highlights their potential use in valleytronics.

摘要

层状过渡金属二卤化物(TMDCs)的共价键面内异质结构(HS)在谷电子学方面具有为高速电子设备提供巨大潜力。在这项研究中,通过脉冲激光沉积辅助硒化方法生长出高质量的单层 MoSe-WSe 横向 HS。通过形貌和光学特性验证了横向 HS 的锐界面。有趣的是,从界面获得的光致发光光谱显示出原始 MoSe 和 WSe 的相当清晰的特征,没有与层内激子物质或 MoWSe 合金形成相关的中间能量峰,从而确认了锐界面。此外,横向附着的 TMDC 单层的离散性质,每个单层都具有由(K,K')标记的双层简并但不等价的能量谷,对于 MoSe 和(K,K')对于 WSe 在 k 空间中,允许在没有界面交叉干扰的情况下在激发区域内同时控制四个谷。例如,通过控制圆偏振光泵浦的螺旋性,K 和 K'谷或 K 和 K'谷同时被极化,其中在各自的能带边缘达到最大的极化程度。本工作提供了横向锐 HS 的生长机制,并强调了它们在谷电子学中的潜在应用。

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