State Key Laboratory for Artificial Microstructures and Mesoscopic Physics, School of Physics, Peking University, Beijing 100871, China.
Nanoscale. 2017 Oct 5;9(38):14682-14689. doi: 10.1039/c7nr02725g.
To enhance the low hole mobility (∼40 cm V s) of InSe monolayer, a novel two-dimensional (2D) van der Waals heterostructure made of InSe and black phosphorus (BP) monolayers with high hole mobility (∼10 cm V s) has been constructed and its structural and electronic properties are investigated using first-principles calculations. We find that the InSe/BP heterostructure exhibits a direct band gap of 1.39 eV and type-II band alignment with electrons (holes) located in the InSe (BP) layer. The band offsets of InSe and BP are 0.78 eV for the conduction band minimum and 0.86 eV for the valence band maximum, respectively. Surprisingly, the hole mobility in the InSe/BP heterostructure exceeds 10 cm V s, which is one order of magnitude larger than the hole mobility of BP and three orders larger than that of the InSe monolayer. The electron mobility is also increased to 3 × 10 cm V s. The physical reason has been analyzed deeply, and a universal method is proposed to improve the carrier mobility of 2D materials by forming heterostructures with them and other 2D materials with complementary properties. The InSe/BP heterostructure can thus be widely used in nanoscale InSe-based field-effect transistors, photodetectors and photovoltaic devices due to its type-II band alignment and high carrier mobility.
为了提高 InSe 单层的低孔迁移率(约 40 cm V s),我们构建了一种新型的二维(2D)范德华异质结构,由具有高孔迁移率(约 10 cm V s)的 InSe 和黑磷(BP)单层组成,并使用第一性原理计算研究了其结构和电子性质。我们发现,InSe/BP 异质结构表现出 1.39 eV 的直接带隙和 II 型能带排列,其中电子(空穴)位于 InSe(BP)层中。InSe 和 BP 的能带偏移分别为导带最小值的 0.78 eV 和价带最大值的 0.86 eV。令人惊讶的是,InSe/BP 异质结构中的空穴迁移率超过 10 cm V s,比 BP 的空穴迁移率大一个数量级,比 InSe 单层大三个数量级。电子迁移率也增加到 3 × 10 cm V s。我们深入分析了物理原因,并提出了一种通用方法,通过与具有互补性质的其他二维材料形成异质结构,来提高二维材料的载流子迁移率。由于具有 II 型能带排列和高载流子迁移率,InSe/BP 异质结构可以广泛应用于基于纳米级 InSe 的场效应晶体管、光电探测器和光伏器件中。