Vo Dat D, Vu Tuan V, Kartamyshev A I, Ho Thi H, Bui Kieu-My
Laboratory for Computational Physics, Institute for Computational Science and Artificial Intelligence, Van Lang University Ho Chi Minh City Vietnam
Faculty of Mechanical - Electrical and Computer Engineering, School of Technology, Van Lang University Ho Chi Minh City Vietnam.
RSC Adv. 2025 Jul 10;15(30):24236-24246. doi: 10.1039/d5ra03665h.
Functionalization is a widely employed method to enhance the performance of InSe monolayers. However, the impact of atomic adsorption on their electronic and related properties often remains incompletely explored. In this study, we propose a fully hydrogenated 2H-InSe monolayer and utilize first-principles calculations to comprehensively investigate the effects of full hydrogenation on its structural, electronic, piezoelectric, and transport characteristics. Our calculations confirm the dynamic and mechanical stability of this monolayer, exhibiting a Young's modulus of 53.43 N m and a Poisson's ratio of 0.31. In contrast to pristine InSe, the hydrogenated monolayer possesses a larger direct bandgap. Furthermore, the 2H-InSe monolayer demonstrates promising piezoelectric properties, with a piezoelectric coefficient of 1.53 × 10 cm and of 3.75 pm V. The charge carrier mobility is influenced by polar optical phonon (POP), ionized impurity (IMP), acoustic deformation potential (ADP), and piezoelectric (PIE) scattering mechanisms. POP scattering dominates at a low carrier concentration of 10 cm, while IMP scattering becomes dominant at a high carrier concentration of 10 cm. The calculated total electron and hole mobilities are 546.55 cm V s and 93.21 cm V s, respectively, which decrease to 45.55 cm V s and 6.51 cm V s as the temperature increases from 50 K to 400 K. Although charge carrier mobilities are low at high concentrations, 7.16-11.58 cm V s, their magnitude is well maintained with increasing temperature.
功能化是一种广泛应用于提高InSe单层性能的方法。然而,原子吸附对其电子及相关性质的影响往往仍未得到充分探索。在本研究中,我们提出了一种完全氢化的2H-InSe单层,并利用第一性原理计算全面研究了完全氢化对其结构、电子、压电和输运特性的影响。我们的计算证实了该单层的动力学和力学稳定性,其杨氏模量为53.43 N/m,泊松比为0.31。与原始InSe相比,氢化单层具有更大的直接带隙。此外,2H-InSe单层表现出有前景的压电性能,压电系数d11为1.53×10⁻² C/m,d33为3.75 pm/V。载流子迁移率受极性光学声子(POP)、电离杂质(IMP)、声学形变势(ADP)和压电(PIE)散射机制的影响。在低载流子浓度10¹³ cm⁻³时,POP散射占主导,而在高载流子浓度10¹⁸ cm⁻³时,IMP散射成为主导。计算得到的总电子和空穴迁移率分别为546.55 cm²/V·s和93.21 cm²/V·s,当温度从50 K升高到400 K时,它们分别降至45.55 cm²/V·s和6.51 cm²/V·s。尽管在高浓度下载流子迁移率较低,为7.16 - 11.58 cm²/V·s,但随着温度升高,其大小保持良好。