Behera Saraswati, Joseph Joby
Opt Lett. 2017 Jul 1;42(13):2607-2610. doi: 10.1364/OL.42.002607.
In this Letter, we report a large-area and single-step optical fabrication technique based on phase engineering interference lithography that is scalable and reconfigurable for the realization of submicrometer scale periodic face-centered cubic inverse woodpile photonic structures. The realized inverse woodpile structure on positive having four number axial layers with 740 nm spatial and 1046 nm axial periodicities shows 10% reflectance and 90% transmittance at 776 nm wavelength that can further be improved for the addition of axial layers. The realized structure can be transferred to crystalline silicon for realizing a bandpass/rejection near-infrared filter in a reflection/transmission mode. Further, woodpile structures based on low-contrast silicon nitride (SiN) are designed as selective narrow frequency filters at 1310 and 1550 nm wavelengths for telecommunication applications and omnidirectional red-green-blue filters for display devices by tuning the design parameters.
在本信函中，我们报道了一种基于相位工程干涉光刻的大面积单步光学制造技术，该技术可扩展且可重构，用于实现亚微米级周期性面心立方反木堆光子结构。在正色光刻胶上实现的具有四个轴向层、空间周期为740 nm且轴向周期为1046 nm的反木堆结构，在776 nm波长处显示出10%的反射率和90%的透射率，随着轴向层数的增加，该性能还可进一步提高。所实现的结构可转移到晶体硅上，以在反射/透射模式下实现带通/陷波近红外滤波器。此外，通过调整设计参数，基于低对比度氮化硅（SiN）的木堆结构被设计为用于电信应用的1310和1550 nm波长的选择性窄频率滤波器以及用于显示设备的全向红-绿-蓝滤波器。
