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H 在 Si(100)表面振动弛豫动力学中的同位素效应。

Isotopic effects in vibrational relaxation dynamics of H on a Si(100) surface.

机构信息

Institut für Chemie, Universität Potsdam, Karl-Liebknecht-Strasse 24-25, D-14476 Potsdam-Golm, Germany.

出版信息

J Chem Phys. 2017 Oct 14;147(14):144703. doi: 10.1063/1.4994635.

DOI:10.1063/1.4994635
PMID:29031276
Abstract

In a recent paper [U. Lorenz and P. Saalfrank, Chem. Phys. 482, 69 (2017)], we proposed a robust scheme to set up a system-bath model Hamiltonian, describing the coupling of adsorbate vibrations (system) to surface phonons (bath), from first principles. The method is based on an embedded cluster approach, using orthogonal coordinates for system and bath modes, and an anharmonic phononic expansion of the system-bath interaction up to second order. In this contribution, we use this model Hamiltonian to calculate vibrational relaxation rates of H-Si and D-Si bending modes, coupled to a fully H(D)-covered Si(100)-(2×1) surface, at zero temperature. The D-Si bending mode has an anharmonic frequency lying inside the bath frequency spectrum, whereas the H-Si bending mode frequency is outside the bath Debye band. Therefore, in the present calculations, we only take into account one-phonon system-bath couplings for the D-Si system and both one- and two-phonon interaction terms in the case of H-Si. The computation of vibrational lifetimes is performed with two different approaches, namely, Fermi's golden rule, and a generalized Bixon-Jortner model built in a restricted vibrational space of the adsorbate-surface zeroth-order Hamiltonian. For D-Si, the Bixon-Jortner Hamiltonian can be solved by exact diagonalization, serving as a benchmark, whereas for H-Si, an iterative scheme based on the recursive residue generation method is applied, with excellent convergence properties. We found that the lifetimes obtained with perturbation theory, albeit having almost the same order of magnitude-a few hundred fs for D-Si and a couple of ps for H-Si-, are strongly dependent on the discretized numerical representation of the bath spectral density. On the other hand, the Bixon-Jortner model is free of such numerical deficiencies, therefore providing better estimates of vibrational relaxation rates, at a very low computational cost. The results obtained with this model clearly show a net exponential decay of the time-dependent survival probability for the H-Si initial vibrational state, allowing an easy extraction of the bending mode "lifetime." This is in contrast with the D-Si system, whose survival probability exhibits a non-monotonic decay, making it difficult to define such a lifetime. This different behavior of the vibrational decay is rationalized in terms of the power spectrum of the adsorbate-surface system. In the case of D-Si, it consists of several, non-uniformly distributed peaks around the bending mode frequency, whereas the H-Si spectrum exhibits a single Lorentzian lineshape, whose width corresponds to the calculated lifetime. The present work gives some insight into mechanisms of vibration-phonon coupling at surfaces. It also serves as a benchmark for multidimensional system-bath quantum dynamics, for comparison with approximate schemes such as reduced, open-system density matrix theory (where the bath is traced out and a Liouville-von Neumann equation is solved) or approximate wavefunction methods to solve the combined system-bath Schrödinger equation.

摘要

在最近的一篇论文[U. Lorenz 和 P. Saalfrank,Chem. Phys. 482, 69 (2017)]中,我们提出了一种从第一性原理出发建立描述吸附质振动(系统)与表面声子(浴)耦合的系统-浴模型哈密顿量的稳健方案。该方法基于嵌入簇方法,使用系统和浴模式的正交坐标,并将系统-浴相互作用展开到二阶的非谐声子展开。在本贡献中,我们使用这个模型哈密顿量来计算零温下耦合到完全 H(D)-覆盖的 Si(100)-(2×1)表面的 H-Si 和 D-Si 弯曲模式的振动弛豫速率。D-Si 弯曲模式的非谐频率位于浴频带内,而 H-Si 弯曲模式的频率在浴德拜带之外。因此,在目前的计算中,我们仅考虑 D-Si 系统的单声子系统-浴耦合,而对于 H-Si,则考虑单声子和两声子相互作用项。振动寿命的计算采用两种不同的方法,即费米黄金规则和在吸附物-表面零阶哈密顿量的受限振动空间中构建的广义 Bixon-Jortner 模型。对于 D-Si,Bixon-Jortner 哈密顿量可以通过精确对角化求解,作为基准,而对于 H-Si,则应用基于递归残差生成方法的迭代方案,具有出色的收敛特性。我们发现,尽管微扰理论得到的寿命具有几乎相同的数量级——对于 D-Si 为几百飞秒,对于 H-Si 为几皮秒——但它们强烈依赖于浴谱密度的离散数值表示。另一方面,Bixon-Jortner 模型没有这种数值缺陷,因此可以以非常低的计算成本提供更好的振动弛豫速率估计。该模型得到的结果清楚地表明,H-Si 初始振动状态的时间相关存活概率呈指数衰减,允许轻松提取弯曲模式“寿命”。这与 D-Si 系统形成对比,其存活概率呈现非单调衰减,使得难以定义这样的寿命。这种振动衰减的不同行为可以根据吸附物-表面系统的功率谱来解释。对于 D-Si,它由弯曲模式频率周围几个不均匀分布的峰值组成,而 H-Si 光谱则表现出单个洛伦兹线形状,其宽度对应于计算出的寿命。本工作深入了解了表面上振动-声子耦合的机制。它还可作为多维系统-浴量子动力学的基准,与约化、开系统密度矩阵理论(其中浴被追踪并求解刘维尔-冯诺依曼方程)或近似波函数方法等近似方案进行比较,以求解组合系统-浴薛定谔方程。

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