Jooshesh Afshin, Fesharaki Faezeh, Bahrami-Yekta Vahid, Mahtab Mahsa, Tiedje Thomas, Darcie Thomas E, Gordon Reuven
Opt Express. 2017 Sep 4;25(18):22140-22148. doi: 10.1364/OE.25.022140.
Photocurrent generation in low-temperature-grown GaAs (LT-GaAs) has been significantly improved by growing a thin AlAs isolation layer between the LT-GaAs layer and semi-insulating (SI)-GaAs substrate. The AlAs layer allows greater arsenic incorporation into the LT-GaAs layer, prevents current diffusion into the GaAs substrate, and provides optical back-reflection that enhances below bandgap terahertz generation. Our plasmon-enhanced LT-GaAs/AlAs photoconductive antennas provide 4.5 THz bandwidth and 75 dB signal-to-noise ratio (SNR) under 50 mW of 1570 nm excitation, whereas the structure without the AlAs layer gives 3 THz bandwidth, 65 dB SNR for the same conditions.
通过在低温生长的砷化镓(LT-GaAs)层与半绝缘(SI)-砷化镓衬底之间生长一层薄的砷化铝(AlAs)隔离层,低温生长的砷化镓中的光电流产生得到了显著改善。AlAs层允许更多的砷掺入LT-GaAs层,防止电流扩散到GaAs衬底中,并提供光背反射,增强带隙以下太赫兹的产生。我们的等离子体增强LT-GaAs/AlAs光电导天线在1570nm激发功率为50mW的情况下,提供4.5THz带宽和75dB的信噪比(SNR),而没有AlAs层的结构在相同条件下给出3THz带宽、65dB SNR。