Suppr超能文献

通过分子插层实现能带边缘工程:提高少层黑磷稳定性的新策略。

Band-edge engineering via molecule intercalation: a new strategy to improve stability of few-layer black phosphorus.

作者信息

Zhou Qionghua, Li Qiang, Yuan Shijun, Chen Qian, Wang Jinlan

机构信息

School of Physics, Southeast University, Nanjing, 211189, China.

出版信息

Phys Chem Chem Phys. 2017 Nov 8;19(43):29232-29236. doi: 10.1039/c7cp05730j.

Abstract

The poor environmental stability of black phosphorous (BP) seriously limits its practical applications in (opto)electronics. Other than capping protective layers on its surface, herein we propose a new strategy to improve BP's ambient stability by engineering the interlayer interactions. Our first-principles calculations demonstrate that enlarging the interlayer spacing can effectively shift the conduction band minimum down to suppress the generation of superoxide and the enlargement can be achieved by intercalating small molecules like H and He into BP. Moreover, the molecule intercalated BP maintains high hole mobility, which makes it a better two-dimensional semiconductor for practical applications.

摘要

黑磷(BP)较差的环境稳定性严重限制了其在(光)电子学中的实际应用。除了在其表面覆盖保护层之外,在此我们提出一种通过调控层间相互作用来提高BP环境稳定性的新策略。我们的第一性原理计算表明,增大层间距可以有效地将导带最小值向下移动以抑制超氧化物的产生,并且通过将诸如H和He等小分子插入BP中可以实现层间距的增大。此外,分子插层后的BP保持了较高的空穴迁移率,这使其成为一种更适合实际应用的二维半导体。

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验