Pluchery Olivier, Caillard Louis, Dollfus Philippe, Chabal Yves J
Sorbonne Université, UPMC Univ Paris 06 , CNRS, Institut des Nanosciences de Paris, 4 place Jussieu, 75005 Paris, France.
Laboratory for Surface & Nanostructure Modifications, Department of Materials Science and Engineering, University of Texas at Dallas , 800 West Campbell Road, Dallas, Texas 75080, United States.
J Phys Chem B. 2018 Jan 18;122(2):897-903. doi: 10.1021/acs.jpcb.7b06979. Epub 2017 Nov 7.
Single charge electronics offer a way for disruptive technology in nanoelectronics. Coulomb blockade is a realistic way for controlling the electric current through a device with the accuracy of one electron. In such devices the current exhibits a step-like increase upon bias which reflects the discrete nature of the fundamental charge. We have assembled a double tunnel junction on an oxide-free silicon substrate that exhibits Coulomb staircase characteristics using gold nanoparticles (AuNPs) as Coulomb islands. The first tunnel junction is an insulating layer made of a grafted organic monolayer (GOM) developed for this purpose. The GOM also serves for attaching AuNPs covalently. The second tunnel junction is made by the tip of an STM. We show that this device exhibits reproducible Coulomb blockade I-V curves at 40 K in vacuum. We also show that depending on the doping of the silicon substrate, the whole Coulomb staircase can be adjusted. We have developed a simulation approach based on the orthodox theory that was completed by calculating the bias dependent tunnel barriers and by including an accurate calculation of the band bending. This model accounts for the experimental data and the doping dependence of Coulomb oscillations. This study opens new perspectives toward designing new kind of single electron transistors (SET) based on this dependence of the Coulomb staircase with the charge carrier concentration.
单电荷电子学为纳米电子学中的颠覆性技术提供了一条途径。库仑阻塞是一种以单个电子的精度控制通过器件的电流的现实方法。在这类器件中,电流在偏置时呈现出阶梯状增加,这反映了基本电荷的离散性质。我们在无氧化物的硅衬底上组装了一个双隧道结,该双隧道结使用金纳米颗粒(AuNP)作为库仑岛,呈现出库仑阶梯特性。第一个隧道结是为此目的开发的由接枝有机单层(GOM)制成的绝缘层。GOM还用于共价连接AuNP。第二个隧道结由扫描隧道显微镜(STM)的针尖制成。我们表明,该器件在真空中40K时呈现出可重复的库仑阻塞I-V曲线。我们还表明,根据硅衬底的掺杂情况,可以调整整个库仑阶梯。我们基于正统理论开发了一种模拟方法,该方法通过计算与偏置相关的隧道势垒并包括对能带弯曲的精确计算而得以完善。该模型解释了实验数据以及库仑振荡的掺杂依赖性。这项研究基于库仑阶梯与电荷载流子浓度的这种依赖性,为设计新型单电子晶体管(SET)开辟了新的前景。