钛镍硅合金上钛镍硅氧纳米结构的光电化学水分解特性

Photoelectrochemical Water Splitting Properties of Ti-Ni-Si-O Nanostructures on Ti-Ni-Si Alloy.

作者信息

Li Ting, Ding Dongyan, Dong Zhenbiao, Ning Congqin

机构信息

Institute of Electronic Materials and Technology, School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200240, China.

State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China.

出版信息

Nanomaterials (Basel). 2017 Oct 31;7(11):359. doi: 10.3390/nano7110359.

DOI:10.3390/nano7110359

PMID:29088083

原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC5707576/

Abstract

Ti-Ni-Si-O nanostructures were successfully prepared on Ti-1Ni-5Si alloy foils via electrochemical anodization in ethylene glycol/glycerol solutions containing a small amount of water. The Ti-Ni-Si-O nanostructures were characterized by field-emission scanning electron microscopy (FE-SEM), energy dispersive spectroscopy (EDS), X-ray diffraction (XRD), and diffuse reflectance absorption spectra. Furthermore, the photoelectrochemical water splitting properties of the Ti-Ni-Si-O nanostructure films were investigated. It was found that, after anodization, three different kinds of Ti-Ni-Si-O nanostructures formed in the α-Ti phase region, Ti₂Ni phase region, and Ti₅Si₃ phase region of the alloy surface. Both the anatase and rutile phases of Ti-Ni-Si-O oxide appeared after annealing at 500 °C for 2 h. The photocurrent density obtained from the Ti-Ni-Si-O nanostructure photoanodes was 0.45 mA/cm² at 0 V (vs. Ag/AgCl) in 1 M KOH solution. The above findings make it feasible to further explore excellent photoelectrochemical properties of the nanostructure-modified surface of Ti-Ni-Si ternary alloys.

摘要

通过在含有少量水的乙二醇/甘油溶液中进行电化学阳极氧化，在Ti-1Ni-5Si合金箔上成功制备了Ti-Ni-Si-O纳米结构。采用场发射扫描电子显微镜（FE-SEM）、能谱仪（EDS）、X射线衍射（XRD）和漫反射吸收光谱对Ti-Ni-Si-O纳米结构进行了表征。此外，还研究了Ti-Ni-Si-O纳米结构薄膜的光电化学水分解性能。结果发现，阳极氧化后，在合金表面的α-Ti相区、Ti₂Ni相区和Ti₅Si₃相区形成了三种不同类型的Ti-Ni-Si-O纳米结构。在500℃退火2 h后，Ti-Ni-Si-O氧化物同时出现了锐钛矿相和金红石相。在1 M KOH溶液中，Ti-Ni-Si-O纳米结构光阳极在0 V（相对于Ag/AgCl）时的光电流密度为0.45 mA/cm²。上述发现使得进一步探索Ti-Ni-Si三元合金纳米结构改性表面优异的光电化学性能成为可能。