Zhang Ju, Zhang Xiwen, Wang Yuanxu
Institute for Computational Materials Science, School of Physics and Electronics, Henan University, Kaifeng, 475004, People's Republic of China.
Sci Rep. 2017 Nov 6;7(1):14590. doi: 10.1038/s41598-017-15205-y.
Previous experiments showed that Hf/Sb co-doping in ZrNiSn impressively improved the electrical conductivity (σ). To explore the physical reasons for this improvement, the electronic structures of HfZrNiSnSb (x = 0, 0.25, 0.5; y = 0, 0.02) have been systematically investigated by using the first-principles method and semiclassical Boltzmann transport theory. 50% Hf doping at Zr site in ZrNiSn simultaneously increases the degeneracy and dispersion of energy bands near the conduction band edge, which are helpful to optimizing Seebeck coefficient and slightly improving σ. Furthermore, 2% Sb co-doping at Sn site in HfZrNiSn not only increases total density of states near the Fermi energy but also retains high mobility, and N reaches eleven at the conduction band minimum, thereby inducing a large improvement in σ. Additionally, the Bader charge analysis shows the reason why Sb co-doping supplies more electrons. It is most likely derived from that Sb loses more electrons and Sb-Ni has a stronger hybridization than Sn-Ni. Moreover, we predict that the ZT of HfZrNiSnSb at 1000 K can reach 1.37 with the carrier concentration of 7.56 × 10 cm, indicating that Hf/Sb co-doping may be an effective approach in optimizing thermoelectric properties of ZrNiSn alloy compounds.
先前的实验表明,在ZrNiSn中进行Hf/Sb共掺杂能显著提高电导率(σ)。为探究这种提高的物理原因,采用第一性原理方法和半经典玻尔兹曼输运理论对HfZrNiSnSb(x = 0、0.25、0.5;y = 0、0.02)的电子结构进行了系统研究。在ZrNiSn的Zr位点进行50%的Hf掺杂同时增加了导带边缘附近能带的简并度和色散,这有助于优化塞贝克系数并略微提高σ。此外,在HfZrNiSn的Sn位点进行2%的Sb共掺杂不仅增加了费米能附近的总态密度,还保持了高迁移率,并且在导带最小值处N达到11,从而使σ有大幅提高。另外,巴德电荷分析揭示了Sb共掺杂提供更多电子的原因。这很可能源于Sb失去更多电子且Sb-Ni的杂化比Sn-Ni更强。此外,我们预测在1000 K时,HfZrNiSnSb的ZT值在载流子浓度为7.56×10 cm时可达到1.37,这表明Hf/Sb共掺杂可能是优化ZrNiSn合金化合物热电性能的有效方法。