Jeonju Center, Korea Basic Science Institute , Jeonju 54907, Jeollabuk-do, Republic of Korea.
Department of Advanced Functional Thin Films, Surface Technology Division, Korea Institute of Materials Science (KIMS) , 797 Changwondaero, Sungsan-gu, Changwon 51508, Gyeongnam, Republic of Korea.
ACS Appl Mater Interfaces. 2017 Nov 29;9(47):41537-41545. doi: 10.1021/acsami.7b11983. Epub 2017 Nov 14.
Atomically thin two-dimensional (2D) van der Waals (vdW) heterostructures are one of the very important research issues for stacked optoelectronic device applications. In this study, using the transferred and stacked NbSe-WSe films as electrodes and a channel, we fabricated the field-effect transistor (FET) devices based on 2D-2D vdW metal-semiconductor heterojunctions (HJs) and systematically studied their ultraviolet (UV) wavelength-dependent electrical and photoresponse properties. Upon the exposure to UV light with a wavelength of 365 nm, the NbSe-WSe vdW HJFET devices exhibited threshold voltage shift toward positive gate bias direction, a current increase, and a nonlinear photocurrent increase upon applying a gate bias due to the contribution of the photogenerated hole current. In contrast, for the 254 nm UV-irradiated FET devices, the drain current was decreased dramatically and the threshold voltage was negatively shifted. The time-resolved photoresponse properties showed that the device current after turning off the 254 nm UV light was completely and much more rapidly recovered compared with the case of the persistent photocurrent after turning off the 365 nm UV light. Interestingly, we found that the wettability of the WSe surface was changed with increasing irradiation time only after 254 nm UV irradiation. The measured wetting behavior on the WSe surface provided direct evidence that the experimentally observed UV-wavelength-dependent phenomena was attributed to the UV-induced dissociative adsorption of oxygen and water molecules, leading to the modulation of charge trap states on the photogenerated and intrinsic carriers in the p-type WSe channel. This study will help provide an understanding of the influence of environmental and electrical measurement conditions on the electrical and optical properties of 2D-2D vdW HJ devices for a variety of device applications through the stacking of 2D heterostructures.
原子层薄的二维(2D)范德华(vdW)异质结构是堆叠型光电设备应用中一个非常重要的研究课题。在这项研究中,我们使用转移和堆叠的 NbSe-WSe 薄膜作为电极和沟道,制作了基于 2D-2D vdW 金属半导体异质结(HJ)的场效应晶体管(FET)器件,并系统地研究了它们对紫外(UV)波长的依赖的电和光响应特性。在暴露于 365nm 波长的紫外光下时,NbSe-WSe vdW HJFET 器件由于光生空穴电流的贡献,表现出向正栅极偏置方向的阈值电压偏移、电流增加和非线性光电流增加。相比之下,对于 254nm 紫外光辐照的 FET 器件,漏极电流急剧下降,阈值电压负向偏移。时间分辨光响应特性表明,与关闭 365nm 紫外光后的持续光电流相比,关闭 254nm 紫外光后的器件电流完全且更快地恢复。有趣的是,我们发现只有在 254nm 紫外光照射后,WSe 表面的润湿性才会随照射时间而变化。在 WSe 表面上测量到的润湿性行为提供了直接的证据,表明实验观察到的紫外波长依赖现象归因于氧和水分子的紫外诱导离解吸附,导致在 p 型 WSe 沟道中的光生和本征载流子的电荷俘获态的调制。这项研究将有助于通过堆叠二维异质结构,为各种器件应用提供对 2D-2D vdW HJ 器件的电和光学性质的影响的理解,包括环境和电气测量条件的影响。