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钼碲在真空退火下的缺陷和表面结构稳定性。

Defects and Surface Structural Stability of MoTe Under Vacuum Annealing.

机构信息

Department of Materials Science and Engineering, The University of Texas at Dallas , 800 West Campbell Road, Richardson, Texas 75080, United States.

出版信息

ACS Nano. 2017 Nov 28;11(11):11005-11014. doi: 10.1021/acsnano.7b04984. Epub 2017 Nov 14.

Abstract

Understanding the structural stability of transition-metal dichalcogenides is necessary to avoid surface/interface degradation. In this work, the structural stability of 2H-MoTe with thermal treatments up to 500 °C is studied using scanning tunneling microscopy and scanning transmission electron microscopy. On the exfoliated sample surface at room temperature, atomic subsurface donors originating from excess Te atoms are observed and presented as nanometer-sized, electronically-induced protrusions superimposed with the hexagonal lattice structure of MoTe. Under a thermal treatment as low as 200 °C, the surface decomposition-induced cluster defects and Te vacancies are readily detected and increase in extent with the increasing temperature. Driven by Te vacancies and thermal energy, intense 60° inversion domain boundaries form resulting in a "wagon wheel" morphology after 400 °C annealing for 15 min. Scanning tunneling spectroscopy identified the electronic states at the domain boundaries and the domain centers. To prevent extensive Te loss at higher temperatures, where MoTe nanowire formation and substantial desorption-induced etching effects will take place simultaneously, surface and edge passivation with a monolayer graphene coverage on MoTe is tested. With this passivation strategy, the structural stability of MoTe is greatly enhanced up to 500 °C without apparent structural defects.

摘要

了解过渡金属二卤化物的结构稳定性对于避免表面/界面降解是必要的。在这项工作中,使用扫描隧道显微镜和扫描透射电子显微镜研究了高达 500°C 的热退火处理 2H-MoTe 的结构稳定性。在室温下的剥离样品表面上,观察到源自过量 Te 原子的原子次表面供体,并呈现为纳米级、电子诱导的突起,叠加在 MoTe 的六方晶格结构上。在低至 200°C 的热处理下,表面分解诱导的团簇缺陷和 Te 空位很容易被检测到,并且随着温度的升高而增加。在 Te 空位和热能的驱动下,形成强烈的 60°反相畴界,在 400°C 退火 15 分钟后形成“马车车轮”形态。扫描隧道光谱学确定了畴界和畴中心的电子态。为了防止在更高温度下发生大量的 Te 损失,其中 MoTe 纳米线形成和大量的脱附诱导蚀刻效应将同时发生,在 MoTe 上进行单层石墨烯覆盖的表面和边缘钝化被测试。通过这种钝化策略,MoTe 的结构稳定性在高达 500°C 的温度下得到了极大的提高,而没有明显的结构缺陷。

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