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在平面和弯曲基底上通过模板辅助电沉积镍及镍/金纳米线。

Template-assisted electrodeposition of Ni and Ni/Au nanowires on planar and curved substrates.

作者信息

Guiliani Jason, Cadena John, Monton Carlos

机构信息

Department of Physics and Astronomy, The University of Texas at San Antonio, San Antonio, TX 78249, United States of America.

出版信息

Nanotechnology. 2018 Feb 16;29(7):075301. doi: 10.1088/1361-6528/aaa261.

Abstract

We present a variant of the template-assisted electrodeposition method that enables the synthesis of large arrays of nanowires (NWs) on flat and curved substrates. This method uses ultra-thin (50 nm-10 μm) anodic aluminum oxide membranes as a template. We have developed a procedure that uses a two-polymer protective layer to transfer these templates onto almost any surface. We have applied this technique to the fabrication of large arrays of Ni and segmented composition Ni/Au NWs on silicon wafers, Cu tapes, and thin (0.2 mm) Cu wires. In all cases, a complete coverage with NWs is achieved. The magnetic properties of these samples show an accentuated in-plane anisotropy which is affected by the form of the substrate (flat or curve) and the length of the NWs. Unlike current lithography techniques, the fabrication method proposed here allows the integration of complex nanostructures into devices, which can be fabricated on unconventional surfaces.

摘要

我们展示了一种模板辅助电沉积方法的变体,该方法能够在平坦和弯曲的基板上合成大量的纳米线阵列。此方法使用超薄(50纳米至10微米)的阳极氧化铝膜作为模板。我们开发了一种使用双聚合物保护层的程序,可将这些模板转移到几乎任何表面上。我们已将此技术应用于在硅片、铜带和细(0.2毫米)铜线上制造大量的镍和分段组成的镍/金纳米线阵列。在所有情况下,均实现了纳米线的完全覆盖。这些样品的磁性表现出明显的面内各向异性,这受到基板形式(平坦或弯曲)和纳米线长度的影响。与当前的光刻技术不同,这里提出的制造方法允许将复杂的纳米结构集成到器件中,这些器件可以在非常规表面上制造。

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